Final Program and Abstracts: 1984 Fall Meeting, Materials Research Society : November 26-30, 1984, Marriott Hotel/Copley Place, Boston, Massachusetts |
Contents
Job Placement Center | 1 |
Von Hippel Award and Lecture | 7 |
Symposium B Laser Chemical Processing of Semiconductor Devices | 61 |
14 other sections not shown
Common terms and phrases
alloys amorphous analysis annealing atoms beam behavior carbon catalysts cement ceramic Characterization chemical composition compounds concentration crystalline defects density Department of Energy deposition diffusion discussed dislocation dopant doped effects electrical electron microscopy Engineering epitaxial etching experimental fibers fly ash formation fractal fracture GaAs gettering graphite GRAPHITE INTERCALATION COMPOUNDS growth hydrogen impurities Institute of Technology interactions intercalation interface investigated ion implantation irradiation kinetics laser lattice layers leaching Materials Research Materials Science measurements mechanism metal microstructure Murray Hill November 27 nuclear waste Oak Ridge National observed oxide oxygen particles phase plasma properties pulsed rapid thermal annealing reaction repository Research Center Research Laboratory Ridge National Laboratory samples Sandia National Laboratories semiconductor silicide silicon single crystal solid solubility spectroscopy structure substrate superlattice surface techniques tests thermal thin films transition transmission electron microscopy U.S. Department University wafers waste form waste glass x-ray diffraction Yorktown Heights