Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
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Page 202
... Pumps High - vacuum pumping [ 177 ] of sputter coaters has traditionally been accomplished by diffusion pumps , oil - sealed mechanical pumps , and a liquid nitrogen cryotrap . Now there are two alternative methods of pump- ing ...
... Pumps High - vacuum pumping [ 177 ] of sputter coaters has traditionally been accomplished by diffusion pumps , oil - sealed mechanical pumps , and a liquid nitrogen cryotrap . Now there are two alternative methods of pump- ing ...
Page 710
... pumps have to be operated with synthetic fluids . Fomblin [ 97 ] or Krytox [ 98 ] , perfluorinated polyethers , are practically the only oils that can be used over extended periods of time to pump the highly corrosive gas mixtures . In ...
... pumps have to be operated with synthetic fluids . Fomblin [ 97 ] or Krytox [ 98 ] , perfluorinated polyethers , are practically the only oils that can be used over extended periods of time to pump the highly corrosive gas mixtures . In ...
Page 712
... pump oil does not come in contact with any parts made from aluminum . Such pumps have to be refilled much more often than those made completely from stainless steel . In addition , it must be noted that when PFPE - type oils are used on ...
... pump oil does not come in contact with any parts made from aluminum . Such pumps have to be refilled much more often than those made completely from stainless steel . In addition , it must be noted that when PFPE - type oils are used on ...
Contents
Rossnagel | 12 |
A Plasma Potential | 14 |
B Floating Potential C Sheaths | 15 |
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alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound Crystal Growth density deposition rate device dielectric dopant doping effects Electrochem emission epitaxial etch rate evaporation film deposition flow flux GaAs gas-phase gases glow discharge grid growth rate heater heating increase ion beam ion bombardment ion energy ion source ionization kinetic laser layer Lett LPCVD magnetic field magnetron material metal molecules nitride OMVPE optical oxide particle PECVD photochemical photodeposition photon photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reaction reactor refractory metal region remote PECVD sample semiconductor shown in Fig SiH4 silane silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering stoichiometric substrate substrate temperature surface susceptor target techniques Technol thermal thickness thin film Thin Solid Films tion torr typically vacuum voltage wafer wavelength