Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
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Results 1-3 of 63
Page 288
... studies are used in the following subsections to illustrate different aspects of CVD chemistry . Additional mechanistic studies have been reviewed by Jasinski et al . [ 87 ] . 1. Gas - Phase Chemistry a . Silane Chemistry The pyrolysis ...
... studies are used in the following subsections to illustrate different aspects of CVD chemistry . Additional mechanistic studies have been reviewed by Jasinski et al . [ 87 ] . 1. Gas - Phase Chemistry a . Silane Chemistry The pyrolysis ...
Page 304
... studies [ 186 , 193 , 196 , 212 , 213 ] . 2. Examples of CVD Reactor Models There have been numerous modeling studies of CVD reactors , and it is not possible to mention all of them in this general survey . Models pub- lished up to mid ...
... studies [ 186 , 193 , 196 , 212 , 213 ] . 2. Examples of CVD Reactor Models There have been numerous modeling studies of CVD reactors , and it is not possible to mention all of them in this general survey . Models pub- lished up to mid ...
Page 597
... studies , can be written as O2 * + SiH4 → SiO2 + 2H2O . ( 4.3 ) Finally , changes in the relative concentrations of ... studies that would support the formation of gaseous molecular species with any type of Si - O bonding group [ 46 ...
... studies , can be written as O2 * + SiH4 → SiO2 + 2H2O . ( 4.3 ) Finally , changes in the relative concentrations of ... studies that would support the formation of gaseous molecular species with any type of Si - O bonding group [ 46 ...
Contents
Rossnagel | 12 |
A Plasma Potential | 14 |
B Floating Potential C Sheaths | 15 |
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alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound Crystal Growth density deposition rate device dielectric dopant doping effects Electrochem emission epitaxial etch rate evaporation film deposition flow flux GaAs gas-phase gases glow discharge grid growth rate heater heating increase ion beam ion bombardment ion energy ion source ionization kinetic laser layer Lett LPCVD magnetic field magnetron material metal molecules nitride OMVPE optical oxide particle PECVD photochemical photodeposition photon photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reaction reactor refractory metal region remote PECVD sample semiconductor shown in Fig SiH4 silane silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering stoichiometric substrate substrate temperature surface susceptor target techniques Technol thermal thickness thin film Thin Solid Films tion torr typically vacuum voltage wafer wavelength