Low-dielectric Constant Materials, Volume 476Materials Research Society, 1997 - Electric insulators and insulation |
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Page 115
... layer followed by a blanket 1 μm thick layer of the FPI which is capped with a 3000Å PE - TEOS SiO2 capping layer deposited at 400 ° C . Prior to capping , the FPI film is first degassed for 60 sec to remove moisture and other volatiles ...
... layer followed by a blanket 1 μm thick layer of the FPI which is capped with a 3000Å PE - TEOS SiO2 capping layer deposited at 400 ° C . Prior to capping , the FPI film is first degassed for 60 sec to remove moisture and other volatiles ...
Page 138
... layer film are cut , peeled off the wafer , and the force - strain curve collected . The force- strain curve for the FPI film layer only is calculated by subtracting the substrate force - strain curve from the dual - layer force ...
... layer film are cut , peeled off the wafer , and the force - strain curve collected . The force- strain curve for the FPI film layer only is calculated by subtracting the substrate force - strain curve from the dual - layer force ...
Page 267
... layer which induces a greater amount of stress relaxation in the Al layer after repetitive thermal cycles [ 2 ] . While Al / SiO2 interface remains stable during thermal processing [ 2 ] , the diffusion of F out of SiOF upon annealing ...
... layer which induces a greater amount of stress relaxation in the Al layer after repetitive thermal cycles [ 2 ] . While Al / SiO2 interface remains stable during thermal processing [ 2 ] , the diffusion of F out of SiOF upon annealing ...
Contents
Polynorbornene for Lowk Interconnection | 3 |
SILK Polymer Coating With LowDielectric Constant | 9 |
F During Oxygen Plasma Annealing | 19 |
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1997 Materials Research adhesion aerogel annealing atoms BCB film bond BPDA-PDA capacitance Chemat-B chemical cm¹ CMP process coating copolymers cured films curve decrease delamination density deposition rate device dielectric constant dielectric material diffusion e-beam cured electron Figure film stress film thickness films deposited fluorinated polyimide fluorine fluoropolymer FSG films FTEOS films FTIR gap fill glass transition temperature heating in-plane increase integrated circuits interface labile block layer low dielectric constant low-k Materials Research Society measured mechanical metal lines modulus moisture Multilevel Interconnection norbornene out-of-plane oxide oxygen parylene Parylene-N peak PECVD Phys planarization plasma plasma treatment polishing polyimide polymer precursor pressure Proc properties PTFE ratio reaction refractive index sample shows Si-F Si-O-Si silica silicon SiO2 SiOF films slurry spectra spin-coated spin-on structure substrate surface Symp Teflon-AF temperature TEOS thermal cycles thermal stability thin films ULSI wafer wet etch