Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
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Page viii
... Remote Plasma - Enhanced Chemical - Vapor Deposition 565 Lucovsky , D. V. Tsu , R. A. Rudder , and R. J. Markunas I. Introduction 566 II . Plasma - Enhanced CVD Process Reactions 569 III . Remote PECVD Processing Equipment 574 IV . Remote ...
... Remote Plasma - Enhanced Chemical - Vapor Deposition 565 Lucovsky , D. V. Tsu , R. A. Rudder , and R. J. Markunas I. Introduction 566 II . Plasma - Enhanced CVD Process Reactions 569 III . Remote PECVD Processing Equipment 574 IV . Remote ...
Page 566
... PECVD Thin Films A. Properties B. Device Applications VI . Summary and Conclusions Acknowledgments References 611 ... remote plasma - enhanced CVD , or simply remote PECVD [ 1 ] . It has also been called indirect plasma CVD , IPCVD [ 2 ] ...
... PECVD Thin Films A. Properties B. Device Applications VI . Summary and Conclusions Acknowledgments References 611 ... remote plasma - enhanced CVD , or simply remote PECVD [ 1 ] . It has also been called indirect plasma CVD , IPCVD [ 2 ] ...
Page 593
... remote PECVD provide an opportunity to separately analyze , and thereby to control , each step of the deposition process sequence . This is difficult , if not impossible , in direct PECVD . The following questions have been addressed ...
... remote PECVD provide an opportunity to separately analyze , and thereby to control , each step of the deposition process sequence . This is difficult , if not impossible , in direct PECVD . The following questions have been addressed ...
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Common terms and phrases
alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound semiconductors compounds Crystal Growth CVD reactors density deposition process deposition rate device dielectric diffusion dopant doping effects Electrochem electron emission epitaxial etch rate film deposition flux GaAs gas-phase gases glow discharge grid growth rate heating increase ion beam ion bombardment ion energy ion source ionization K. F. Jensen kinetics laser layer Lett LPCVD magnetic field magnetron material metal mtorr nitride nucleation OMVPE optical oxide particle PECVD photochemical photodeposition photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reactive region remote PECVD semiconductor SiH4 silane silicides silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering substrate substrate temperature susceptor target techniques Technol Technology thermal thin films Thin Solid Films tion torr typically vacuum voltage wafer wavelength