Glass, Volume 17Minoru Tomozawa, Robert Heward Doremus |
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Page 59
... film on the glass surface ( Hench , 1975 ) . However , this film only forms after con- siderable reaction in a static solution , and may be important in enhancing resistance to alkaline attack ( see below ) , but it cannot explain the ...
... film on the glass surface ( Hench , 1975 ) . However , this film only forms after con- siderable reaction in a static solution , and may be important in enhancing resistance to alkaline attack ( see below ) , but it cannot explain the ...
Page 249
... film . In the deposition of a 1.50 μm film on ten silicon wafers , Pliskin and Conrad ( 1964 ) achieved this thickness within ± 0.03 μm on all the wafers , and the average variation across a wafer was 0.06 μm . The hot - dip technique ...
... film . In the deposition of a 1.50 μm film on ten silicon wafers , Pliskin and Conrad ( 1964 ) achieved this thickness within ± 0.03 μm on all the wafers , and the average variation across a wafer was 0.06 μm . The hot - dip technique ...
Page 309
... film form by ion sputtering . Cohen ( 1957 ) has reported a band in neutron - irradiated fused silica at 245 nm ( 5.1 eV ) , which is also observed in sputtered SiO2 films ( Hickmott , 1969 ) and in ion - implanted bulk samples ( Arnold ...
... film form by ion sputtering . Cohen ( 1957 ) has reported a band in neutron - irradiated fused silica at 245 nm ( 5.1 eV ) , which is also observed in sputtered SiO2 films ( Hickmott , 1969 ) and in ion - implanted bulk samples ( Arnold ...
Contents
Solubility Models | 9 |
Effect of Experimental Variables on Gas Mobility in Vitreous Materials | 16 |
Phase Separation and Crystallization | 26 |
Copyright | |
18 other sections not shown
Common terms and phrases
activation energy addition alkali alkali ions alkali silicate glasses annealing atom band bleaching BOHC borate boron borosilicate glass cation Ceram Chem chemical durability components concentration crystallization curve decrease defect centers devitrifiable solder glasses Doremus effect ESR spectra eV band experimental Friebele fused silica glass surface glass systems glasses containing grinding Griscom heat treatment helium hole center hole trapped hydrogen hyperfine immiscibility immiscibility boundary increase indentation irradiation lapping hardness layer measured mole Na₂O Non-Cryst nonbridging oxygen nucleation observed optical absorption oxide glasses oxygen particle PbTiO3 permeability phase separation Phys polishing grains polishing rate powder properties radiation radiation-induced reaction samples Section Shelby shown in Fig silicate glasses SiO2 sodium softening point solder glass composites solubility spectrum spinodal decomposition structure studies Table Takamori thermal expansion coefficient tion Tomozawa U.S. Patent viscosity vitreous silica vitreous solder glass volume loss