MEMS and Microsystems: Design and ManufactureMicrosystems and MEMS technology is one of the biggest breakthroughs in the area of mechanical and electronic technology in recent years. This is the technology of extremely small and powerful devices, and systems built around them, which have mechanical and electrical components. MEMS technology is expanding rapidly, with major application areas being telecommunications, biomedical technology, manufacturing and robotic systems, transportation and aerospace. Academics are desperate for texts to familiarise future engineers with this broad-ranging technology. This text provides an engineering design approach to MEMS and microsystems which is appropriate for professionals and senior level students. This design approach is conveyed through good examples, cases and applied problems. The book is appropriate for mechanical and aerospace engineers, since it carefully explains the electrical/electronic aspects of the subject. Electrical engineering students will be given strong coverage of the mechanical side of MEMS, something they may not receive elsewhere. |
From inside the book
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Page 276
... ions , whether they are boron ions or phosphorus ions , must carry sufficient kinetic energy to be implanted ( that is , to penetrate ) into the silicon substrate . For this reason , the ion implantation procedure always involves the ...
... ions , whether they are boron ions or phosphorus ions , must carry sufficient kinetic energy to be implanted ( that is , to penetrate ) into the silicon substrate . For this reason , the ion implantation procedure always involves the ...
Page 277
... ion beam Silicon substrate ions in the beam are then energized in the acceleration tube , or accelerator , in which the final energy with which the ions will impact the substrate surface is attained . The ions in the beam are focused ...
... ion beam Silicon substrate ions in the beam are then energized in the acceleration tube , or accelerator , in which the final energy with which the ions will impact the substrate surface is attained . The ions in the beam are focused ...
Page 315
... ions bombard only the normal surface of the substrate . Etching of the substrate materials is accomplished by the high - energy ions in the plasma bombarding the substrate surface with simultaneous chemical reactions between the ...
... ions bombard only the normal surface of the substrate . Etching of the substrate materials is accomplished by the high - energy ions in the plasma bombarding the substrate surface with simultaneous chemical reactions between the ...
Common terms and phrases
accelerometer analysis applications atoms beam boundary conditions capacitance capillary chemical coefficient components Constraint base deflection deposition described in Chapter devices diaphragm diffusion dopant doping dynamic electric resistance electrons electrostatic forces engineering Equation etchants etching example fabrication finite element finite element analysis fluid flow fracture geometry heat conduction heat flux heat transfer illustrated in Figure interface involves ions layer LIGA process mask mass maximum mechanical MEMS and microsystems metal micro microaccelerometer microdevices microelectronics microfabrication microfluidics micromanufacturing micropressure sensors microsensors microstructures microsystem design microsystem packaging microvalves molecules n-type output oxidation phonon photolithography photoresist piezoelectric piezoresistors plane plasma plate polymers pressure sensor production pumping ratio reactant scaling shear shown in Figure signal transduction silicon dioxide silicon substrate SiO2 solid solution structure submicrometer substrate materials surface micromachining Table techniques temperature thickness thin films transducers tube velocity vibration voltage wet etching wire bonds Young's modulus