MEMS and Microsystems: Design and ManufactureMicrosystems and MEMS technology is one of the biggest breakthroughs in the area of mechanical and electronic technology in recent years. This is the technology of extremely small and powerful devices, and systems built around them, which have mechanical and electrical components. MEMS technology is expanding rapidly, with major application areas being telecommunications, biomedical technology, manufacturing and robotic systems, transportation and aerospace. Academics are desperate for texts to familiarise future engineers with this broad-ranging technology. This text provides an engineering design approach to MEMS and microsystems which is appropriate for professionals and senior level students. This design approach is conveyed through good examples, cases and applied problems. The book is appropriate for mechanical and aerospace engineers, since it carefully explains the electrical/electronic aspects of the subject. Electrical engineering students will be given strong coverage of the mechanical side of MEMS, something they may not receive elsewhere. |
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Page 264
... etch rate , and low damage . In the case of Al - Si - Cu alloy RIE , it is reported that residues to be observed after etching are consisted of precipitated Cu [ 3 ] or Al2Cu [ 4,5 ] and a large dc bias is necessary to remove these ...
... etch rate , and low damage . In the case of Al - Si - Cu alloy RIE , it is reported that residues to be observed after etching are consisted of precipitated Cu [ 3 ] or Al2Cu [ 4,5 ] and a large dc bias is necessary to remove these ...
Page 263
... etch process window are improved by an optimization of wafer temperature uniformity . An etch defect in - line monitoring scheme is developed , which is applicable for both process / hardware optimization and process in - situ control ...
... etch process window are improved by an optimization of wafer temperature uniformity . An etch defect in - line monitoring scheme is developed , which is applicable for both process / hardware optimization and process in - situ control ...
Page 396
... etched-mirror lasers on double heterostructure (DH) wafers, it is necessary to use an etching solution that gives an etching profile with vertical mirror walls and gives the same etching rates for the individual DH layers. For the ...
... etched-mirror lasers on double heterostructure (DH) wafers, it is necessary to use an etching solution that gives an etching profile with vertical mirror walls and gives the same etching rates for the individual DH layers. For the ...
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Common terms and phrases
accelerometer analysis applications atoms beam boundary conditions capacitance capillary chemical coefficient components Constraint base deflection deposition described in Chapter devices diaphragm diffusion dopant doping dynamic electric resistance electrons electrostatic forces engineering Equation etchants etching example fabrication finite element finite element analysis fluid flow fracture geometry heat conduction heat flux heat transfer illustrated in Figure interface involves ions layer LIGA process mask mass maximum mechanical MEMS and microsystems metal micro microaccelerometer microdevices microelectronics microfabrication microfluidics micromanufacturing micropressure sensors microsensors microstructures microsystem design microsystem packaging microvalves molecules n-type output oxidation phonon photolithography photoresist piezoelectric piezoresistors plane plasma plate polymers pressure sensor production pumping ratio reactant scaling shear shown in Figure signal transduction silicon dioxide silicon substrate SiO2 solid solution structure submicrometer substrate materials surface micromachining Table techniques temperature thickness thin films transducers tube velocity vibration voltage wet etching wire bonds Young's modulus