MEMS and Microsystems: Design and ManufactureMicrosystems and MEMS technology is one of the biggest breakthroughs in the area of mechanical and electronic technology in recent years. This is the technology of extremely small and powerful devices, and systems built around them, which have mechanical and electrical components. MEMS technology is expanding rapidly, with major application areas being telecommunications, biomedical technology, manufacturing and robotic systems, transportation and aerospace. Academics are desperate for texts to familiarise future engineers with this broad-ranging technology. This text provides an engineering design approach to MEMS and microsystems which is appropriate for professionals and senior level students. This design approach is conveyed through good examples, cases and applied problems. The book is appropriate for mechanical and aerospace engineers, since it carefully explains the electrical/electronic aspects of the subject. Electrical engineering students will be given strong coverage of the mechanical side of MEMS, something they may not receive elsewhere. |
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Page 39
... metals are vulnerable to oxidation when exposed to air for a long time . Significant oxide layer built up over the metal surface can change material properties such as the electrical resistance of the metal . This natural phe- nomenon ...
... metals are vulnerable to oxidation when exposed to air for a long time . Significant oxide layer built up over the metal surface can change material properties such as the electrical resistance of the metal . This natural phe- nomenon ...
Page 40
... Metal oxide gas sensors . This type of sensor works on a principle similar to that of chemiresistor sensors . Several semiconducting metals , such as SnO2 , change their electric resistance after absorbing certain gases . The process is ...
... Metal oxide gas sensors . This type of sensor works on a principle similar to that of chemiresistor sensors . Several semiconducting metals , such as SnO2 , change their electric resistance after absorbing certain gases . The process is ...
Page 44
... Metal pad Metal pad R3 Ri R2 Silicon diaphragm Pyrex glass constraining base or metal header Interconnect Top view of silicon die Wire bond Piezoresistors Metal film Dielectric layer R3 ( + v ) + Vin R2 ( -v ) R1 ( + v ) a Vo R4 ( -v ) ...
... Metal pad Metal pad R3 Ri R2 Silicon diaphragm Pyrex glass constraining base or metal header Interconnect Top view of silicon die Wire bond Piezoresistors Metal film Dielectric layer R3 ( + v ) + Vin R2 ( -v ) R1 ( + v ) a Vo R4 ( -v ) ...
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Common terms and phrases
accelerometer analysis applications atoms beam boundary conditions capacitance capillary chemical coefficient components Constraint base deflection deposition described in Chapter devices diaphragm diffusion dopant doping dynamic electric resistance electrons electrostatic forces engineering Equation etchants etching example fabrication finite element finite element analysis fluid flow fracture geometry heat conduction heat flux heat transfer illustrated in Figure interface involves ions layer LIGA process mask mass maximum mechanical MEMS and microsystems metal micro microaccelerometer microdevices microelectronics microfabrication microfluidics micromanufacturing micropressure sensors microsensors microstructures microsystem design microsystem packaging microvalves molecules n-type output oxidation phonon photolithography photoresist piezoelectric piezoresistors plane plasma plate polymers pressure sensor production pumping ratio reactant scaling shear shown in Figure signal transduction silicon dioxide silicon substrate SiO2 solid solution structure submicrometer substrate materials surface micromachining Table techniques temperature thickness thin films transducers tube velocity vibration voltage wet etching wire bonds Young's modulus