Thin Film ProcessesRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page vii
... of Glow Discharge Polymerization Organic Compounds for Glow Discharge Polymerization Dependence of Glow Discharge Polymerization on Processing Factors References 381 396 * Present address: Motorola, Inc., Phoenix, Arizona 85002 CONTENTS ...
... of Glow Discharge Polymerization Organic Compounds for Glow Discharge Polymerization Dependence of Glow Discharge Polymerization on Processing Factors References 381 396 * Present address: Motorola, Inc., Phoenix, Arizona 85002 CONTENTS ...
Page 4
... compounds by the glow discharge decomposition of reagents normally used in chemical vapor deposition. Chapter IV-2 discusses the processes involved in polymerization of monomers in a glow discharge. Part V covers etching techniques for ...
... compounds by the glow discharge decomposition of reagents normally used in chemical vapor deposition. Chapter IV-2 discusses the processes involved in polymerization of monomers in a glow discharge. Part V covers etching techniques for ...
Page 5
... compounds with film surfaces, and reactive-ion etching which is a hybrid process that uses rf-sputter etching equipment with reactive gases similar to those used in plasma etching. ll. OTHER FILM DEPOSITION PROCESSES Numerous important ...
... compounds with film surfaces, and reactive-ion etching which is a hybrid process that uses rf-sputter etching equipment with reactive gases similar to those used in plasma etching. ll. OTHER FILM DEPOSITION PROCESSES Numerous important ...
Page 13
... compound is synthesized by sputtering a metal target (e.g., Ti) in a reactive gas (e.g., 02 or Ar—02 mixtures) to form ... compounds (e.g., CO) that are pumped away [1]. Chemical sputtering is more. II-l. GLOW DISCHARGE SPUTTER DEPOSITION I3.
... compound is synthesized by sputtering a metal target (e.g., Ti) in a reactive gas (e.g., 02 or Ar—02 mixtures) to form ... compounds (e.g., CO) that are pumped away [1]. Chemical sputtering is more. II-l. GLOW DISCHARGE SPUTTER DEPOSITION I3.
Page 15
... compounds, or mixtures are sputtered. As will be shown, the sputtering yield of material A from a matrix of A + B is often very different from the sputtering yield of A from a matrix of A. Also, when sputtering yields of compounds are ...
... compounds, or mixtures are sputtered. As will be shown, the sputtering yield of material A from a matrix of A + B is often very different from the sputtering yield of A from a matrix of A. Also, when sputtering yields of compounds are ...
Contents
9 | |
Chemical Methods of Film Deposition | 207 |
Physicalchemical Methods of Film Deposition | 333 |
Etching Processes | 399 |
Index | 557 |
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A/min Abstr alloys anode Appl argon atoms cathode Chem chemical Chemical vapor deposition coatings composition compounds configuration current density deposition rate effect efficiency electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition first flow rate flux GaAs gas flow gases glow discharge polymerization heat increase ion beam deposition ion etching ionization Kern layer magnetic field magnetron mask metal mTorr nitride oxide photoresist Phys planar plasma etching plating PM sputtering pm/min polishing polymer polymer deposition potential pressure Proc produce profile ratio RCA Rev reaction reactive reactive sputtering reactor reflected Semiconductors shown in Fig SiH4 silicon silicon nitride SiO2 solution species sputter deposition sputter etching Sputter Gun sputtering yield starting material stoichiometry substrate sufficient susceptor techniques Technol temperature thermal thickness thin film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York