Thin Film ProcessesRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page vi
... Planar Magnetron Sputtering RF Planar Magnetron Sputtering Applications Conclusions References II-5 Ion Beam Deposition James M. E. Harper I. II. III. IV. V. Introduction Ion Beam Generation Secondary Ion Beam Deposition Primary Ion ...
... Planar Magnetron Sputtering RF Planar Magnetron Sputtering Applications Conclusions References II-5 Ion Beam Deposition James M. E. Harper I. II. III. IV. V. Introduction Ion Beam Generation Secondary Ion Beam Deposition Primary Ion ...
Page 3
... planar and conical configurations in which there are gradient magnetic fields. The basic physics of uniform and gradient fields are. 3 Copyright © I978 by Academic Press. Inc. All rights of reproduction in any form reserved. ISBN 0-l2 ...
... planar and conical configurations in which there are gradient magnetic fields. The basic physics of uniform and gradient fields are. 3 Copyright © I978 by Academic Press. Inc. All rights of reproduction in any form reserved. ISBN 0-l2 ...
Page 54
... a systematic error since the true potential is the sum. Fig. 15. Idealized l-V characteristics of a Langmuir probe in a glow discharge. Fig. 1. Schematic representation of the plasma in planar diode. 54 J. L. VOSSEN AND J. J. CUOMO.
... a systematic error since the true potential is the sum. Fig. 15. Idealized l-V characteristics of a Langmuir probe in a glow discharge. Fig. 1. Schematic representation of the plasma in planar diode. 54 J. L. VOSSEN AND J. J. CUOMO.
Page 76
... planar diodes. Figure 1 shows a typical planar diode (see Chapter 11-1, Sections 111 and IV). A low pressure abnormal negative glow discharge [1. 2] is maintained between the cathode (target) and an adjacent anode (substrate mounting ...
... planar diodes. Figure 1 shows a typical planar diode (see Chapter 11-1, Sections 111 and IV). A low pressure abnormal negative glow discharge [1. 2] is maintained between the cathode (target) and an adjacent anode (substrate mounting ...
Page 77
... PLANAR DIODE AT \\ _ a 20 / 3000', \ 0.1 w 0 1 1 1 1 . 1 1 1 1 1 . 1 1 1 1 0 l 1 0 20 40 60 80 100 120 140 160 180 200 ARGON PRESSURE lmTorrl Fig. 2. Influence of working gas pressure on deposition rate for a nonmagnetron sputtering ...
... PLANAR DIODE AT \\ _ a 20 / 3000', \ 0.1 w 0 1 1 1 1 . 1 1 1 1 1 . 1 1 1 1 0 l 1 0 20 40 60 80 100 120 140 160 180 200 ARGON PRESSURE lmTorrl Fig. 2. Influence of working gas pressure on deposition rate for a nonmagnetron sputtering ...
Contents
9 | |
Chemical Methods of Film Deposition | 207 |
Physicalchemical Methods of Film Deposition | 333 |
Etching Processes | 399 |
Index | 557 |
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A/min Abstr alloys anode Appl argon atoms cathode Chem chemical Chemical vapor deposition coatings composition compounds configuration current density deposition rate effect efficiency electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition first flow rate flux GaAs gas flow gases glow discharge polymerization heat increase ion beam deposition ion etching ionization Kern layer magnetic field magnetron mask metal mTorr nitride oxide photoresist Phys planar plasma etching plating PM sputtering pm/min polishing polymer polymer deposition potential pressure Proc produce profile ratio RCA Rev reaction reactive reactive sputtering reactor reflected Semiconductors shown in Fig SiH4 silicon silicon nitride SiO2 solution species sputter deposition sputter etching Sputter Gun sputtering yield starting material stoichiometry substrate sufficient susceptor techniques Technol temperature thermal thickness thin film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York