Thin Film ProcessesRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page vi
... Reactive Sputtering Summary References 11-3 The Sputter and S-Gun Magnetrons David B. Fraser I. II. III. IV. V. VI. Introduction Description Operational Characteristics Bias Operation Film Deposition Conclusions References 114 Planar ...
... Reactive Sputtering Summary References 11-3 The Sputter and S-Gun Magnetrons David B. Fraser I. II. III. IV. V. VI. Introduction Description Operational Characteristics Bias Operation Film Deposition Conclusions References 114 Planar ...
Page 5
... reactive-ion etching which is a hybrid process that uses rf-sputter etching equipment with reactive gases similar to those used in plasma etching. ll. OTHER FILM DEPOSITION PROCESSES Numerous important processes for film deposition are ...
... reactive-ion etching which is a hybrid process that uses rf-sputter etching equipment with reactive gases similar to those used in plasma etching. ll. OTHER FILM DEPOSITION PROCESSES Numerous important processes for film deposition are ...
Page 12
John L. Vossen. B. Presputtering of Targets 42 C. Sputter Etching of Substrates 42 VI. The Sputtering Gas 46 A. Effects of Gas Species, Pressure, and Flow 46 B. Sources of Gas Contamination 46 C. Getter Sputtering 47 D. Reactive ...
John L. Vossen. B. Presputtering of Targets 42 C. Sputter Etching of Substrates 42 VI. The Sputtering Gas 46 A. Effects of Gas Species, Pressure, and Flow 46 B. Sources of Gas Contamination 46 C. Getter Sputtering 47 D. Reactive ...
Page 13
... reactive sputtering process in which a compound is synthesized by sputtering a metal target (e.g., Ti) in a reactive gas (e.g., 02 or Ar—02 mixtures) to form a compound of the ... sputtering is more. II-l. GLOW DISCHARGE SPUTTER DEPOSITION ...
... reactive sputtering process in which a compound is synthesized by sputtering a metal target (e.g., Ti) in a reactive gas (e.g., 02 or Ar—02 mixtures) to form a compound of the ... sputtering is more. II-l. GLOW DISCHARGE SPUTTER DEPOSITION ...
Page 23
... sputtering conditions, it is possible to compensate for this effect by purposely enriching the target in the ... reactive sputtering. In some cases, sputtering with 100% reactive gas will still not result in stoichiometric films [100] ...
... sputtering conditions, it is possible to compensate for this effect by purposely enriching the target in the ... reactive sputtering. In some cases, sputtering with 100% reactive gas will still not result in stoichiometric films [100] ...
Contents
9 | |
Chemical Methods of Film Deposition | 207 |
Physicalchemical Methods of Film Deposition | 333 |
Etching Processes | 399 |
Index | 557 |
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Common terms and phrases
A/min Abstr alloys anode Appl argon atoms cathode Chem chemical Chemical vapor deposition coatings composition compounds configuration current density deposition rate effect efficiency electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition first flow rate flux GaAs gas flow gases glow discharge polymerization heat increase ion beam deposition ion etching ionization Kern layer magnetic field magnetron mask metal mTorr nitride oxide photoresist Phys planar plasma etching plating PM sputtering pm/min polishing polymer polymer deposition potential pressure Proc produce profile ratio RCA Rev reaction reactive reactive sputtering reactor reflected Semiconductors shown in Fig SiH4 silicon silicon nitride SiO2 solution species sputter deposition sputter etching Sputter Gun sputtering yield starting material stoichiometry substrate sufficient susceptor techniques Technol temperature thermal thickness thin film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York