Thin Film ProcessesRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page iv
... Thin film processes. Includes bibliographical references. 1. Thin films. I. Vossen, John L. II. Kern, Werner, Date TK787].15.F5T43 621.381'73 78—3348 ISBN 0—12—728250—5 PRINTED IN THE UNITED STATES OF AMERICA Characteristic Aspects of ...
... Thin film processes. Includes bibliographical references. 1. Thin films. I. Vossen, John L. II. Kern, Werner, Date TK787].15.F5T43 621.381'73 78—3348 ISBN 0—12—728250—5 PRINTED IN THE UNITED STATES OF AMERICA Characteristic Aspects of ...
Page vii
... FILM DEPOSITION IV-l Plasma Deposition of Inorganic Thin Films J. R. I. II. III. IV. Hollahan and R. S. Rosier Introduction Experimental Requirements and Techniques Deposition of Thin Inorganic Films Conclusions, Applications, and ...
... FILM DEPOSITION IV-l Plasma Deposition of Inorganic Thin Films J. R. I. II. III. IV. Hollahan and R. S. Rosier Introduction Experimental Requirements and Techniques Deposition of Thin Inorganic Films Conclusions, Applications, and ...
Page 5
... thin-film processes are not yet mature enough to warrant a review. Also, processes which generally involve very thick films (>25 um) have not been included. While these processes are not specifically covered in this book, their ...
... thin-film processes are not yet mature enough to warrant a review. Also, processes which generally involve very thick films (>25 um) have not been included. While these processes are not specifically covered in this book, their ...
Page 6
... Thin Solid Films 39, 105 (1976). C. J. Dell'Oca, D. L. Pulfrey, and L. Young, Phys. Thin Films 6, l (1971). J. F. O'Hanlon, J. Vac. Sci. Techno]. 7, 330, (1970). J. F. O'Hanlon, in “Oxides and Oxide Films" (A. K. Vijh, ed.), Vol. 5, p ...
... Thin Solid Films 39, 105 (1976). C. J. Dell'Oca, D. L. Pulfrey, and L. Young, Phys. Thin Films 6, l (1971). J. F. O'Hanlon, J. Vac. Sci. Techno]. 7, 330, (1970). J. F. O'Hanlon, in “Oxides and Oxide Films" (A. K. Vijh, ed.), Vol. 5, p ...
Page 12
... Film 50 A. Plasma, Floating, and Bias Potentials 50 B. Gas Incorporation and Desorption 53 C. Stoichiometry of Films 60 D. Physical Film Properties 60 VIII. Rate and Uniformity of Deposition 6] IX. Conclusion 62 References 62 I ...
... Film 50 A. Plasma, Floating, and Bias Potentials 50 B. Gas Incorporation and Desorption 53 C. Stoichiometry of Films 60 D. Physical Film Properties 60 VIII. Rate and Uniformity of Deposition 6] IX. Conclusion 62 References 62 I ...
Contents
9 | |
Chemical Methods of Film Deposition | 207 |
Physicalchemical Methods of Film Deposition | 333 |
Etching Processes | 399 |
Index | 557 |
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A/min Abstr alloys anode Appl argon atoms cathode Chem chemical Chemical vapor deposition coatings composition compounds configuration current density deposition rate effect efficiency electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition first flow rate flux GaAs gas flow gases glow discharge polymerization heat increase ion beam deposition ion etching ionization Kern layer magnetic field magnetron mask metal mTorr nitride oxide photoresist Phys planar plasma etching plating PM sputtering pm/min polishing polymer polymer deposition potential pressure Proc produce profile ratio RCA Rev reaction reactive reactive sputtering reactor reflected Semiconductors shown in Fig SiH4 silicon silicon nitride SiO2 solution species sputter deposition sputter etching Sputter Gun sputtering yield starting material stoichiometry substrate sufficient susceptor techniques Technol temperature thermal thickness thin film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York