Low-dielectric Constant MaterialsMaterials Research Society, 1998 - Electric insulators and insulation |
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Page 86
... materials ( Oxford University Press , New York , NY , 1984 ) . 37A . T. DiBenedetto , The Structure and Properties of Materials ... 1997 ( Materials Research Society ) . смот PHASE SEPARATION BEHAVIORS OF POLYIMIDE BLENDS C.H. RYU , 98 86.
... materials ( Oxford University Press , New York , NY , 1984 ) . 37A . T. DiBenedetto , The Structure and Properties of Materials ... 1997 ( Materials Research Society ) . смот PHASE SEPARATION BEHAVIORS OF POLYIMIDE BLENDS C.H. RYU , 98 86.
Page 131
... Materials for ULSI Interlayer Dielectric Applications , W.W. Lee and P.S. Ho , Guest Editors , Materials Research Society Bulletin , Vol . 22 , No. 10 , p . 19-69 , October 1997 . 2. J.-P. Hirvonen , Handbook of Modern Ion Beam Material ...
... Materials for ULSI Interlayer Dielectric Applications , W.W. Lee and P.S. Ho , Guest Editors , Materials Research Society Bulletin , Vol . 22 , No. 10 , p . 19-69 , October 1997 . 2. J.-P. Hirvonen , Handbook of Modern Ion Beam Material ...
Page 364
... study . REFERENCES [ 1 ] [ 2 ] [ 3 ] [ 4 ] [ 5 ] [ 6 ] [ 7 ] [ 8 ] [ 9 ] [ 10 ] R. Willecke , and P. Ho , in Proceedings of MicroMat97 , edited by B. Michel , and T. Winkler ( Druckhaus Dresden , Dresden , 1997 ) , pp . 721-724 M. Ree ...
... study . REFERENCES [ 1 ] [ 2 ] [ 3 ] [ 4 ] [ 5 ] [ 6 ] [ 7 ] [ 8 ] [ 9 ] [ 10 ] R. Willecke , and P. Ho , in Proceedings of MicroMat97 , edited by B. Michel , and T. Winkler ( Druckhaus Dresden , Dresden , 1997 ) , pp . 721-724 M. Ree ...
Contents
Overview of Process Integration Issues for LowK Dielectrics | 3 |
Fundamental Aspects of Polymer Metallization | 15 |
LiquidPhase Deposition of LowK Organic | 27 |
Copyright | |
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1998 Materials Research a-C:F ILD adhesion aluminum annealing atoms birefringence bonds capacitance capacitors carbon chemical chemical vapor deposition cm¹ coefficient concentration copper crack velocity curing temperature damascene decrease density dielectric constant diffusion electrical electromigration electron ellipsometry energy etch rate film thickness FLAC fluorine fluorocarbon FTIR hard mask hydrogen in-plane increase integration interconnect interface joule heating layer low dielectric constant low k materials low-k Materials Research Society measured mechanical metal lines modulus moisture MSSQ nanoporous oxide oxygen PECVD Phys planarization plasma etching plasma treatment polyimide polymer polymer films polymerization porosity porous silica xerogel precursors Proc properties pulse ratio reaction refractive index resistance samples Semiconductor shown in Figure shows Si-F silica silicon silsesquioxane SiO2 SiOF films spectra spin-coating spin-on stress structure substrate surface Symp technique thermal stability thin films ULSI wafer wiring xerogel xerogel films