Low-dielectric Constant MaterialsMaterials Research Society, 1998 - Electric insulators and insulation |
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Page 148
... FTIR Studies of Molecular Orientation Polarized FTIR can be used to study the relationship between molecular orientations and the dielectric constant . The polarized FTIR spectra of blanket film collected in transmission mode can show ...
... FTIR Studies of Molecular Orientation Polarized FTIR can be used to study the relationship between molecular orientations and the dielectric constant . The polarized FTIR spectra of blanket film collected in transmission mode can show ...
Page 157
... FTIR data . Life expectancy or aging characteristics were also investigated for these features . As an example results on silsesquioxane spin -on glasses are presented . INTRODUCTION In the microelectronics industry the ever increasing ...
... FTIR data . Life expectancy or aging characteristics were also investigated for these features . As an example results on silsesquioxane spin -on glasses are presented . INTRODUCTION In the microelectronics industry the ever increasing ...
Page 236
... FTIR spectra measured before and after annealing , shown in Fig . 3. The noticeable changes in the FTIR spectrum are the growth of the band at 1450 cm1 and 1620 cm ' . Similar change has been observed previously [ 7 ] . The increase at ...
... FTIR spectra measured before and after annealing , shown in Fig . 3. The noticeable changes in the FTIR spectrum are the growth of the band at 1450 cm1 and 1620 cm ' . Similar change has been observed previously [ 7 ] . The increase at ...
Contents
Overview of Process Integration Issues for LowK Dielectrics | 3 |
Fundamental Aspects of Polymer Metallization | 15 |
LiquidPhase Deposition of LowK Organic | 27 |
Copyright | |
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1998 Materials Research a-C:F ILD adhesion aluminum annealing atoms birefringence bonds capacitance capacitors carbon chemical chemical vapor deposition cm¹ coefficient concentration copper crack velocity curing temperature damascene decrease density dielectric constant diffusion electrical electromigration electron ellipsometry energy etch rate film thickness FLAC fluorine fluorocarbon FTIR hard mask hydrogen in-plane increase integration interconnect interface joule heating layer low dielectric constant low k materials low-k Materials Research Society measured mechanical metal lines modulus moisture MSSQ nanoporous oxide oxygen PECVD Phys planarization plasma etching plasma treatment polyimide polymer polymer films polymerization porosity porous silica xerogel precursors Proc properties pulse ratio reaction refractive index resistance samples Semiconductor shown in Figure shows Si-F silica silicon silsesquioxane SiO2 SiOF films spectra spin-coating spin-on stress structure substrate surface Symp technique thermal stability thin films ULSI wafer wiring xerogel xerogel films