Low-dielectric Constant MaterialsMaterials Research Society, 1998 - Electric insulators and insulation |
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Page 69
... nanoporous poly ( methylsilsesquioxane ) have been prepared from organic / inorganic polymer hybrids . Low molecular weight 6 - arm star poly ( caprolactone ) s are incorporated into partially pre - condensed methylsilsesquioxane resin ...
... nanoporous poly ( methylsilsesquioxane ) have been prepared from organic / inorganic polymer hybrids . Low molecular weight 6 - arm star poly ( caprolactone ) s are incorporated into partially pre - condensed methylsilsesquioxane resin ...
Page 105
NANOPOROUS SILICA FOR LOW K DIELECTRICS T. Ramos , K. Rhoderick , R. Roth , L. Brungardt , S. Wallace , J. Drage , J. Dunne , D. Endisch , R. Katsanes , N. Viernes , and D.M. Smith Nanoglass LLC , 1349 Moffett Park Drive . , Sunnyvale ...
NANOPOROUS SILICA FOR LOW K DIELECTRICS T. Ramos , K. Rhoderick , R. Roth , L. Brungardt , S. Wallace , J. Drage , J. Dunne , D. Endisch , R. Katsanes , N. Viernes , and D.M. Smith Nanoglass LLC , 1349 Moffett Park Drive . , Sunnyvale ...
Page 110
... nanoporous silica is the ability / requirement to control thickness and porosity independently of one another . Therefore , the Nanoglass formation process requires slightly different processing than conventional SOG's . Since limited ...
... nanoporous silica is the ability / requirement to control thickness and porosity independently of one another . Therefore , the Nanoglass formation process requires slightly different processing than conventional SOG's . Since limited ...
Contents
Overview of Process Integration Issues for LowK Dielectrics | 3 |
Fundamental Aspects of Polymer Metallization | 15 |
LiquidPhase Deposition of LowK Organic | 27 |
Copyright | |
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1998 Materials Research a-C:F ILD adhesion aluminum annealing atoms birefringence bonds capacitance capacitors carbon chemical chemical vapor deposition cm¹ coefficient concentration copper crack velocity curing temperature damascene decrease density dielectric constant diffusion electrical electromigration electron ellipsometry energy etch rate film thickness FLAC fluorine fluorocarbon FTIR hard mask hydrogen in-plane increase integration interconnect interface joule heating layer low dielectric constant low k materials low-k Materials Research Society measured mechanical metal lines modulus moisture MSSQ nanoporous oxide oxygen PECVD Phys planarization plasma etching plasma treatment polyimide polymer polymer films polymerization porosity porous silica xerogel precursors Proc properties pulse ratio reaction refractive index resistance samples Semiconductor shown in Figure shows Si-F silica silicon silsesquioxane SiO2 SiOF films spectra spin-coating spin-on stress structure substrate surface Symp technique thermal stability thin films ULSI wafer wiring xerogel xerogel films