Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 3
... films are indicated by the dotted regions . junctions . As illustrated in Fig . 2c , this technology permits the simultaneous fabrication of large numbers of p - n junctions on the same ... SILICON DIOXIDE FILMS IN SEMICONDUCTOR DEVICES 3.
... films are indicated by the dotted regions . junctions . As illustrated in Fig . 2c , this technology permits the simultaneous fabrication of large numbers of p - n junctions on the same ... SILICON DIOXIDE FILMS IN SEMICONDUCTOR DEVICES 3.
Page 5
... films were also found to reduce or passivate the intrinsic electrically active defects at the underlying silicon surface ( Atala et al . , 1959 ) . As we shall discuss , this surface ... SILICON DIOXIDE FILMS IN SEMICONDUCTOR DEVICES 5.
... films were also found to reduce or passivate the intrinsic electrically active defects at the underlying silicon surface ( Atala et al . , 1959 ) . As we shall discuss , this surface ... SILICON DIOXIDE FILMS IN SEMICONDUCTOR DEVICES 5.
Page 7
... films as diffusion masks on sources [ see Oldham ( 1977 ) ] . Dielectric films are used for various purposes in microelectronic devices . Some of these uses are shown in Table I along with ... SILICON DIOXIDE FILMS IN SEMICONDUCTOR DEVICES 7.
... films as diffusion masks on sources [ see Oldham ( 1977 ) ] . Dielectric films are used for various purposes in microelectronic devices . Some of these uses are shown in Table I along with ... SILICON DIOXIDE FILMS IN SEMICONDUCTOR DEVICES 7.
Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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absorption coefficient AlF3 analysis BaF2 Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses CCl4 Ceram chemical cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate glasses fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-forming region heavy-metal fluoride glasses HfF4 impurities increase interface traps ions layers leaching Loehman Lucas Manabe Matecki materials measured melt metal Mitachi Miyashita Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys prepared properties Radioactive Waste radionuclides refractive index Rekhson relaxation function sample sandwich seal scattering setting temperature shown in Fig silicon SiO2 Solids solution stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques ternary thermal ThF4 thickness viscoelastic viscosity vitreous fluorides vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4