Glass, Volume 26 |
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Page 35
For commercially available ellipsometers and for SiO2 on high - quality Si
substrates , numerical values for film thickness with an accuracy better than any
other instrument are possible when ellipsometry , typically better than 2 % , is
used .
For commercially available ellipsometers and for SiO2 on high - quality Si
substrates , numerical values for film thickness with an accuracy better than any
other instrument are possible when ellipsometry , typically better than 2 % , is
used .
Page 50
Although state - of - the - art SiO2 films can have a resistivity of better than 1016
12 cm , nonohmic high - field effects can drastically lower this number . The
dominant source of dc conduction in relatively pure silica glass is that associated
with ...
Although state - of - the - art SiO2 films can have a resistivity of better than 1016
12 cm , nonohmic high - field effects can drastically lower this number . The
dominant source of dc conduction in relatively pure silica glass is that associated
with ...
Page 132
diagrams . The amount of SizN4 that will dissolve in a given MgO - Al2O3SiO2 or
CaO - Al2O3 - SiO2 composition to produce the illustrated glassforming regions
is about 10 to 15 wt . % . However , much higher SizN4 solubilities ( up to 30 wt .
diagrams . The amount of SizN4 that will dissolve in a given MgO - Al2O3SiO2 or
CaO - Al2O3 - SiO2 composition to produce the illustrated glassforming regions
is about 10 to 15 wt . % . However , much higher SizN4 solubilities ( up to 30 wt .
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Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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