Glass, Volume 26 |
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Page 18
Therefore , CVD SiO2 is not adequate for certain critical device applications such
as for the gate dielectric for FETs . Primarily SizN4 is used as an oxidation mask
and device encapsulant . In the former application , the oxidation resistance of ...
Therefore , CVD SiO2 is not adequate for certain critical device applications such
as for the gate dielectric for FETs . Primarily SizN4 is used as an oxidation mask
and device encapsulant . In the former application , the oxidation resistance of ...
Page 153
B . Applications Numerous applications have been suggested for heavy - metal
fluoride glasses ; the feasibility of some has been proved , but others are at this
writing speculative . The majority of these applications take advantage of the ...
B . Applications Numerous applications have been suggested for heavy - metal
fluoride glasses ; the feasibility of some has been proved , but others are at this
writing speculative . The majority of these applications take advantage of the ...
Page 155
A related development is the potential use of IR - transmitting fibers in laser -
assisted cauterization or surgical procedures ; the material requirements for such
applications have been described by McCord ( 1981 ) . Other areas of interest ...
A related development is the potential use of IR - transmitting fibers in laser -
assisted cauterization or surgical procedures ; the material requirements for such
applications have been described by McCord ( 1981 ) . Other areas of interest ...
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Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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absorption addition analysis applications Basis bead behavior bulk calculated cause Ceram charge chemical coefficient components compositions conductivity constant containing cooling crystallization curve dependence described devices discussed Drexhage effects elastic electrical electron energy equation et al example fibers field Figure films fluoride glasses fluorozirconate function given heating heavy-metal fluoride glasses illustrated important increase indicated interface ions layers leaching less loss lower materials measured melt metal method nitrogen Nuclear Waste observed obtained occur optical oxide oxynitride glasses Phys physical Poulain predict prepared present produced properties range ratio reduced region relatively relaxation reported result sample scattering seal shown shows silica silicate glasses silicon similar SiO2 SizN4 Solids solution strain stress stress relaxation structural studies surface Table techniques temperature thermal thickness thin transition traps values viscosity Waste Management waste-glass wavelength York