Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
From inside the book
Results 1-3 of 86
Page 42
... effect on the silicon interface . Figure 17 shows the effect that a sheet of N charges per square centimeter located at position x has on the spatial distribution of electric field in an oxide of thickness tox . The field in the absence ...
... effect on the silicon interface . Figure 17 shows the effect that a sheet of N charges per square centimeter located at position x has on the spatial distribution of electric field in an oxide of thickness tox . The field in the absence ...
Page 43
... effect is similar to that encountered in determining the percentages of phases in equilibrium - phase diagrams . For the case of positive charge illustrated here , the field is raised at the silicon interface and lowered at the aluminum ...
... effect is similar to that encountered in determining the percentages of phases in equilibrium - phase diagrams . For the case of positive charge illustrated here , the field is raised at the silicon interface and lowered at the aluminum ...
Page 49
... effect on the operation of MOS devices . The important effect in the thin - film case is the change in silicon surface potential caused by long - term bipolar relaxation effects . Phosphosilicate glass films used as secondary pasivation ...
... effect on the operation of MOS devices . The important effect in the thin - film case is the change in silicon surface potential caused by long - term bipolar relaxation effects . Phosphosilicate glass films used as secondary pasivation ...
Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
Common terms and phrases
absorption coefficient AlF3 analysis BaF2 Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses CCl4 Ceram chemical cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate glasses fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-forming region heavy-metal fluoride glasses HfF4 impurities increase interface traps ions layers leaching Loehman Lucas Manabe Matecki materials measured melt metal Mitachi Miyashita Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys prepared properties Radioactive Waste radionuclides refractive index Rekhson relaxation function sample sandwich seal scattering setting temperature shown in Fig silicon SiO2 Solids solution stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques ternary thermal ThF4 thickness viscoelastic viscosity vitreous fluorides vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4