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Page 23
For AES, electrons with energies of about 1-5 kV are used to eject inner shell
electrons from some surface atoms. This inner shell hole is filled by an outershell
electron dropping down, and the energy lost can be imparted to another electron,
...
For AES, electrons with energies of about 1-5 kV are used to eject inner shell
electrons from some surface atoms. This inner shell hole is filled by an outershell
electron dropping down, and the energy lost can be imparted to another electron,
...
Page 28
Scanning electron microscopy (Wells, 1974) is usually used in applications in
which optical microscopy cannot achieve sufficient magnification and/or depth of
field. To form an SEM image, a specimen is first irradiated with a finely focused ...
Scanning electron microscopy (Wells, 1974) is usually used in applications in
which optical microscopy cannot achieve sufficient magnification and/or depth of
field. To form an SEM image, a specimen is first irradiated with a finely focused ...
Page 30
Transmission electron microscopy (Edington, 1976) also utilizes a focused
electron beam, but it is transmitted through the specimen and then collected. A
typical microscope for TEM utilizes a heated tungsten filament as a source of
electrons, ...
Transmission electron microscopy (Edington, 1976) also utilizes a focused
electron beam, but it is transmitted through the specimen and then collected. A
typical microscope for TEM utilizes a heated tungsten filament as a source of
electrons, ...
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Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
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Common terms and phrases
AlF3 analysis Appl Phys Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses bulk modulus Ceram chemical composite sphere constant cooling corrosion crystalline crystallization curve dB/km devices dielectric differential strain Drexhage durability effects elastic electron energy equation fibers fluorohafnate fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-clad glass-forming region heavy-metal fluoride glasses increase interface traps ions layers leaching Loehman Lucas Matecki materials measured melt metal Mitachi modulus MOSFET nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Poulain radiation Radioactive Waste radionuclides refractive index Rekhson result sample sandwich seal Scherer seal Eq setting temperature shown in Fig Si02 films silicon Solids solution split ring stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques thermal thickness viscoelastic viscosity vitrification Waste Management waste-glass waste-glass forms wavelength ZBLA ZBLAN ZrF4
Bibliographic information
| Title | Glass IV Treatise on Materials Science and Technology, Herbert Herman Volume 26 of Glass, Minoru Tomozawa |
| Authors | Minoru Tomozawa, R. H. Doremus |
| Editors | Minoru Tomozawa, R. H. Doremus |
| Publisher | Academic Press, 1985 |
| Original from | the University of Michigan |
| Digitized | 29 Nov 2007 |
| ISBN | 0123418267, 9780123418265 |
| Length | 333 pages |
| Subjects | › Glass Materials Materials science Technology & Engineering / General Technology & Engineering / Materials Science |
| Export Citation | BiBTeX EndNote RefMan |