Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 6
... example . The conclusions are also applicable to bipolar devices . In this section we shall show that glass films function as masks , as insulation , and as passivation for the surface of devices . All these uses require that the films ...
... example . The conclusions are also applicable to bipolar devices . In this section we shall show that glass films function as masks , as insulation , and as passivation for the surface of devices . All these uses require that the films ...
Page 35
... examples for which the film etch rate must be known . For example , films need to be etched to open contact holes in devices , and films used as processing masks need to be removed . It is also interesting that the chemical etch rates ...
... examples for which the film etch rate must be known . For example , films need to be etched to open contact holes in devices , and films used as processing masks need to be removed . It is also interesting that the chemical etch rates ...
Page 123
... example gives Psio = 3.99 × 10-3 atm , which is over four orders of magnitude less than in the first case . Thus , through proper control of the furnace atmosphere , an otherwise unstable composition can be prepared as a good oxynitride ...
... example gives Psio = 3.99 × 10-3 atm , which is over four orders of magnitude less than in the first case . Thus , through proper control of the furnace atmosphere , an otherwise unstable composition can be prepared as a good oxynitride ...
Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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absorption coefficient AlF3 analysis BaF2 Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses CCl4 Ceram chemical cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate glasses fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-forming region heavy-metal fluoride glasses HfF4 impurities increase interface traps ions layers leaching Loehman Lucas Manabe Matecki materials measured melt metal Mitachi Miyashita Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys prepared properties Radioactive Waste radionuclides refractive index Rekhson relaxation function sample sandwich seal scattering setting temperature shown in Fig silicon SiO2 Solids solution stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques ternary thermal ThF4 thickness viscoelastic viscosity vitreous fluorides vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4