Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 6
... films in these devices , and generally they all use these films in much the same way , i.e. , as passivation and insulation . The foregoing discussion shows in general terms the evolution of the role of glass films in semiconductor ...
... films in these devices , and generally they all use these films in much the same way , i.e. , as passivation and insulation . The foregoing discussion shows in general terms the evolution of the role of glass films in semiconductor ...
Page 33
... films . 3. OTHER CHARACTERIZATION TECHNIQUES Amorphous films such as SiO2 and Si3N4 are good insulators . Since for many applications these films are used to establish electric fields for device operation , the film thickness needs to ...
... films . 3. OTHER CHARACTERIZATION TECHNIQUES Amorphous films such as SiO2 and Si3N4 are good insulators . Since for many applications these films are used to establish electric fields for device operation , the film thickness needs to ...
Page 35
... films and substrate , i.e. , the Fresnel equations , a solution for film thickness and refractive index can be obtained . For commercially available ellipso- meters and for SiO2 on high - quality Si substrates , numerical values for film ...
... films and substrate , i.e. , the Fresnel equations , a solution for film thickness and refractive index can be obtained . For commercially available ellipso- meters and for SiO2 on high - quality Si substrates , numerical values for film ...
Contents
vii | 57 |
RONALD E LOEHMAN 119 Sandia National Laboratories Albuquerque | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
Common terms and phrases
absorption coefficient AlF3 analysis Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses bulk modulus CCl4 Ceram chemical composite sphere constant cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-clad glass-forming region heavy-metal fluoride glasses increase interface traps ions layers leachability leaching Loehman Lucas materials measured melt metal Mitachi modulus MOSFET Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys Poulain properties Radioactive Waste radionuclides refractive index Rekhson result sample sandwich seal Scherer seal Eq setting temperature shown in Fig silicon SiO2 SiO2 films Solids solution split ring stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques thermal thickness viscoelastic viscosity vitreous vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4