Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 8
... nitride , are also listed in Table I. Silicon nitride is used principally as secondary passivation to prevent mechanical damage or ionic contamination of the underlying insulators . It is , however , used as part of a dual gate ...
... nitride , are also listed in Table I. Silicon nitride is used principally as secondary passivation to prevent mechanical damage or ionic contamination of the underlying insulators . It is , however , used as part of a dual gate ...
Page 11
... nitride films are also used as an oxidation mask . Since the nitride film is impervious to oxygen , thick oxide films can be grown in regions not covered by the mask while no further oxidation occurs under the nitride mask . After a ...
... nitride films are also used as an oxidation mask . Since the nitride film is impervious to oxygen , thick oxide films can be grown in regions not covered by the mask while no further oxidation occurs under the nitride mask . After a ...
Page 128
... nitride can dissolve without decompos- ing . The nitride , in turn , seems to promote glass formation . For example , quenching of CaO – SiO2 or MgO - SiO2 melts at rates common in ordinary glass preparation gives a crystalline product ...
... nitride can dissolve without decompos- ing . The nitride , in turn , seems to promote glass formation . For example , quenching of CaO – SiO2 or MgO - SiO2 melts at rates common in ordinary glass preparation gives a crystalline product ...
Contents
vii | 57 |
RONALD E LOEHMAN 119 Sandia National Laboratories Albuquerque | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
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absorption coefficient AlF3 analysis Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses bulk modulus CCl4 Ceram chemical composite sphere constant cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-clad glass-forming region heavy-metal fluoride glasses increase interface traps ions layers leachability leaching Loehman Lucas materials measured melt metal Mitachi modulus MOSFET Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys Poulain properties Radioactive Waste radionuclides refractive index Rekhson result sample sandwich seal Scherer seal Eq setting temperature shown in Fig silicon SiO2 SiO2 films Solids solution split ring stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques thermal thickness viscoelastic viscosity vitreous vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4