Glass, Volume 26 |
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Page 10
The heavily doped p - type silicon under the thick oxide electrically isolates the
active devices . Densely populated integrated circuits require such isolation to
prevent cross talk between neighboring devices fabricated on a single silicon ...
The heavily doped p - type silicon under the thick oxide electrically isolates the
active devices . Densely populated integrated circuits require such isolation to
prevent cross talk between neighboring devices fabricated on a single silicon ...
Page 46
The presence of mobile ions in the oxide is the result of unintentional
contamination during the processing of the device that resulted in instabilities in
MOSFET characteristics . Mobile ions drift from the outer surface of the film closer
to the ...
The presence of mobile ions in the oxide is the result of unintentional
contamination during the processing of the device that resulted in instabilities in
MOSFET characteristics . Mobile ions drift from the outer surface of the film closer
to the ...
Page 47
Annealing at substantially higher temperatures is required to remove fixed
charge from the oxide . The other major category of charge is immobile charge
arising from a variety of miscellaneous sources ; it is grouped under the name
oxide ...
Annealing at substantially higher temperatures is required to remove fixed
charge from the oxide . The other major category of charge is immobile charge
arising from a variety of miscellaneous sources ; it is grouped under the name
oxide ...
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Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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Common terms and phrases
absorption addition analysis applications Basis bead behavior bulk calculated cause Ceram charge chemical coefficient components compositions conductivity constant containing cooling crystallization curve dependence described devices discussed Drexhage effects elastic electrical electron energy equation et al example fibers field Figure films fluoride glasses fluorozirconate function given heating heavy-metal fluoride glasses illustrated important increase indicated interface ions layers leaching less loss lower materials measured melt metal method nitrogen Nuclear Waste observed obtained occur optical oxide oxynitride glasses Phys physical Poulain predict prepared present produced properties range ratio reduced region relatively relaxation reported result sample scattering seal shown shows silica silicate glasses silicon similar SiO2 SizN4 Solids solution strain stress stress relaxation structural studies surface Table techniques temperature thermal thickness thin transition traps values viscosity Waste Management waste-glass wavelength York
Bibliographic information
| Title | Glass, Volume 26 Glass, Minoru Tomozawa Volume 12 of Treatise on materials science and technology |
| Editors | Minoru Tomozawa, R. H. Doremus |
| Publisher | Academic Press, 1977 |
| Original from | the University of Michigan |
| Digitized | 29 Nov 2007 |
| ISBN | 0123418127, 9780123418128 |
| Export Citation | BiBTeX EndNote RefMan |