Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 17
... pressure and plasma oxidation . High - pressure oxidation systems are commercially available , and virtually all the larger semiconductor chip manufacturers use such systems . Essentially , these systems use either dry O2 or steam at ...
... pressure and plasma oxidation . High - pressure oxidation systems are commercially available , and virtually all the larger semiconductor chip manufacturers use such systems . Essentially , these systems use either dry O2 or steam at ...
Page 18
... pressure are critically important . It is intuitive that concentrations and temperatures control rates and stoichiometry . Total pressure determines the mode of mass transport in the CVD reactor . Chemical vapor deposition at 1 atm ...
... pressure are critically important . It is intuitive that concentrations and temperatures control rates and stoichiometry . Total pressure determines the mode of mass transport in the CVD reactor . Chemical vapor deposition at 1 atm ...
Page 107
... pressure will create internal stresses that will be a function of glass porosity and helium solubility . However , it has been shown that relatively large stresses can be accommodated in glass systems without breaking ( Ross and Newman ...
... pressure will create internal stresses that will be a function of glass porosity and helium solubility . However , it has been shown that relatively large stresses can be accommodated in glass systems without breaking ( Ross and Newman ...
Contents
vii | 57 |
RONALD E LOEHMAN 119 Sandia National Laboratories Albuquerque | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
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absorption coefficient AlF3 analysis Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses bulk modulus CCl4 Ceram chemical composite sphere constant cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-clad glass-forming region heavy-metal fluoride glasses increase interface traps ions layers leachability leaching Loehman Lucas materials measured melt metal Mitachi modulus MOSFET Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys Poulain properties Radioactive Waste radionuclides refractive index Rekhson result sample sandwich seal Scherer seal Eq setting temperature shown in Fig silicon SiO2 SiO2 films Solids solution split ring stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques thermal thickness viscoelastic viscosity vitreous vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4