Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 10
... regions on adjacent devices . The oxide thickness in this region is chosen so that under worst - case biasing conditions such parasitic conduction never occurs . Because the thick oxide also serves as the insulation between the silicon ...
... regions on adjacent devices . The oxide thickness in this region is chosen so that under worst - case biasing conditions such parasitic conduction never occurs . Because the thick oxide also serves as the insulation between the silicon ...
Page 39
... region is called accumulation because mobile majority carriers accumulate at the interface . In this region , only the capacitance of the oxide is measured because that of the accumulation layer is effectively infinite . The next region ...
... region is called accumulation because mobile majority carriers accumulate at the interface . In this region , only the capacitance of the oxide is measured because that of the accumulation layer is effectively infinite . The next region ...
Page 132
... regions roughly correspond to the region of the given oxide ternary that is liquid at 1600 ° C and below . That correspondence is a fairly general result , i.e. , oxynitride glasses form in many silicate systems that are liquid below ...
... regions roughly correspond to the region of the given oxide ternary that is liquid at 1600 ° C and below . That correspondence is a fairly general result , i.e. , oxynitride glasses form in many silicate systems that are liquid below ...
Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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absorption coefficient AlF3 analysis BaF2 Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses CCl4 Ceram chemical cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate glasses fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-forming region heavy-metal fluoride glasses HfF4 impurities increase interface traps ions layers leaching Loehman Lucas Manabe Matecki materials measured melt metal Mitachi Miyashita Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys prepared properties Radioactive Waste radionuclides refractive index Rekhson relaxation function sample sandwich seal scattering setting temperature shown in Fig silicon SiO2 Solids solution stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques ternary thermal ThF4 thickness viscoelastic viscosity vitreous fluorides vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4