Glass, Volume 26 |
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Page 3
The doped regions in the silicon are labeled by type as n or p . Current flows
between emitter ( source ) and collector ( drain ) and is controlled by voltages
applied to the base ( gate ) in the bipolar ( FET ) devices . The SiO2 films are
indicated ...
The doped regions in the silicon are labeled by type as n or p . Current flows
between emitter ( source ) and collector ( drain ) and is controlled by voltages
applied to the base ( gate ) in the bipolar ( FET ) devices . The SiO2 films are
indicated ...
Page 9
p - type silicon wafer forms the substrate on which this particular device is built .
Thick and thin oxide layers are grown or deposited on the substrate and act as
diffusion masks at various stages to allow the formation of heavily doped n - type
...
p - type silicon wafer forms the substrate on which this particular device is built .
Thick and thin oxide layers are grown or deposited on the substrate and act as
diffusion masks at various stages to allow the formation of heavily doped n - type
...
Page 43
silicon interface , more image charge is induced on the silicon and the change in
field becomes larger . This lever - arm effect is similar to that encountered in
determining the percentages of phases in equilibrium - phase diagrams . For the
...
silicon interface , more image charge is induced on the silicon and the change in
field becomes larger . This lever - arm effect is similar to that encountered in
determining the percentages of phases in equilibrium - phase diagrams . For the
...
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Contents
Nuclear Waste Glasses | 57 |
Oxynitride Glasses | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
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Common terms and phrases
absorption addition analysis applications Basis bead behavior bulk calculated cause Ceram charge chemical coefficient components compositions conductivity constant containing cooling crystallization curve dependence described devices discussed Drexhage effects elastic electrical electron energy equation et al example fibers field Figure films fluoride glasses fluorozirconate function given heating heavy-metal fluoride glasses illustrated important increase indicated interface ions layers leaching less loss lower materials measured melt metal method nitrogen Nuclear Waste observed obtained occur optical oxide oxynitride glasses Phys physical Poulain predict prepared present produced properties range ratio reduced region relatively relaxation reported result sample scattering seal shown shows silica silicate glasses silicon similar SiO2 SizN4 Solids solution strain stress stress relaxation structural studies surface Table techniques temperature thermal thickness thin transition traps values viscosity Waste Management waste-glass wavelength York
Bibliographic information
| Title | Glass, Volume 26 Glass, Minoru Tomozawa Volume 12 of Treatise on materials science and technology |
| Editors | Minoru Tomozawa, R. H. Doremus |
| Publisher | Academic Press, 1977 |
| Original from | the University of Michigan |
| Digitized | 29 Nov 2007 |
| ISBN | 0123418127, 9780123418128 |
| Export Citation | BiBTeX EndNote RefMan |