Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 5
... surface ( Atala et al . , 1959 ) . As we shall discuss , this surface passivation by oxide films is one of the most important features of the Si - SiO2 system . Bipolar transistors do not rely on SiO2 films for their fundamental ...
... surface ( Atala et al . , 1959 ) . As we shall discuss , this surface passivation by oxide films is one of the most important features of the Si - SiO2 system . Bipolar transistors do not rely on SiO2 films for their fundamental ...
Page 23
... surface of a material . Therefore , the combination of AES and microprobe provides surface and bulk analyses . For AES , electrons with energies of about 1–5 kV are used to eject inner shell electrons from some surface atoms . This ...
... surface of a material . Therefore , the combination of AES and microprobe provides surface and bulk analyses . For AES , electrons with energies of about 1–5 kV are used to eject inner shell electrons from some surface atoms . This ...
Page 99
... surface area must be accounted for when evaluating leachability and fractional release rates . However , an increase in the surface area of a factor of 10 does not mean that fractional release rates will increase by the same factor ...
... surface area must be accounted for when evaluating leachability and fractional release rates . However , an increase in the surface area of a factor of 10 does not mean that fractional release rates will increase by the same factor ...
Contents
vii | 57 |
RONALD E LOEHMAN 119 Sandia National Laboratories Albuquerque | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
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absorption coefficient AlF3 analysis Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses bulk modulus CCl4 Ceram chemical composite sphere constant cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-clad glass-forming region heavy-metal fluoride glasses increase interface traps ions layers leachability leaching Loehman Lucas materials measured melt metal Mitachi modulus MOSFET Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys Poulain properties Radioactive Waste radionuclides refractive index Rekhson result sample sandwich seal Scherer seal Eq setting temperature shown in Fig silicon SiO2 SiO2 films Solids solution split ring stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques thermal thickness viscoelastic viscosity vitreous vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4