Glass, Volume 26Minoru Tomozawa, R. H. Doremus Academic Press, 1977 - Glass |
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Page 11
... vapor deposition ( CVD ) , and physical vapor deposition ( PVD ) will also be discussed in this section . Some emerging preparation techniques such as high- pressure oxidation and plasma oxidation will be presented . Film quality and ...
... vapor deposition ( CVD ) , and physical vapor deposition ( PVD ) will also be discussed in this section . Some emerging preparation techniques such as high- pressure oxidation and plasma oxidation will be presented . Film quality and ...
Page 17
... VAPOR DEPOSITION Chemical vapor deposition is simply the use of a heterogeneous ( gas → solid ) chemical reaction to deposit a desired solid in the form of a film on a desired substrate . For most microelectronics applications , a ...
... VAPOR DEPOSITION Chemical vapor deposition is simply the use of a heterogeneous ( gas → solid ) chemical reaction to deposit a desired solid in the form of a film on a desired substrate . For most microelectronics applications , a ...
Page 19
... vapor deposition techniques such as evaporation and sputtering are important preparative tools worthy of mention . For example , sputtered silica layers are often used to encapsulate integrated circuits . However , no attempt will be ...
... vapor deposition techniques such as evaporation and sputtering are important preparative tools worthy of mention . For example , sputtered silica layers are often used to encapsulate integrated circuits . However , no attempt will be ...
Contents
vii | 57 |
RONALD E LOEHMAN 119 Sandia National Laboratories Albuquerque | 119 |
HeavyMetal Fluoride Glasses | 151 |
Copyright | |
3 other sections not shown
Common terms and phrases
absorption coefficient AlF3 analysis Basis for Nuclear bead seal behavior Bendow borosilicate glass bulk glasses bulk modulus CCl4 Ceram chemical composite sphere constant cooling corrosion crystalline crystallization curve dB/km devices dielectric Drexhage effects elastic electrical electron energy fibers fluorohafnate fluorozirconate glasses fused silica glass formation glass transition glass transition temperature glass-clad glass-forming region heavy-metal fluoride glasses increase interface traps ions layers leachability leaching Loehman Lucas materials measured melt metal Mitachi modulus MOSFET Moynihan nitride nitrogen Non-Cryst Nuclear Waste Nuclear Waste Management observed optical optical fibers oxide glasses oxynitride glasses Phys Poulain properties Radioactive Waste radionuclides refractive index Rekhson result sample sandwich seal Scherer seal Eq setting temperature shown in Fig silicon SiO2 SiO2 films Solids solution split ring stiffness ratio stress relaxation structural relaxation studies Subsection substrate surface Table techniques thermal thickness viscoelastic viscosity vitreous vitrification Waste Management waste-glass forms wavelength ZBLA ZBLAN ZrF4