Construction Materials for Photographic Processing Equipment |
From inside the book
Results 1-3 of 9
Page 19
Acetic acid readily attacks the material , but it is unaffected by water , alkalies ,
and other weak acids . Weatherability is good , but long exposure may cause
changes in appearance . The material can be drilled , punched , sawed , or
turned on ...
Acetic acid readily attacks the material , but it is unaffected by water , alkalies ,
and other weak acids . Weatherability is good , but long exposure may cause
changes in appearance . The material can be drilled , punched , sawed , or
turned on ...
Page 25
The material is resistant to weak acids and alkalies , and exhibits excellent
resistance to organic solvents . Strong acids and alkalies affect the polymer
slightly . Dimensional stability tests are recommended in these solutions prior to
use .
The material is resistant to weak acids and alkalies , and exhibits excellent
resistance to organic solvents . Strong acids and alkalies affect the polymer
slightly . Dimensional stability tests are recommended in these solutions prior to
use .
Page 27
Hytrel polymers are based on aromatic polyesters , and they resist common
solvents , salt solutions , dilute alkalies and mineral acids , and dilute organic
acids . They are soluble in phenols , cresols , and some chlorinated
hydrocarbons such ...
Hytrel polymers are based on aromatic polyesters , and they resist common
solvents , salt solutions , dilute alkalies and mineral acids , and dilute organic
acids . They are soluble in phenols , cresols , and some chlorinated
hydrocarbons such ...
What people are saying - Write a review
We haven't found any reviews in the usual places.
Common terms and phrases
Acetate acids added AISI Type alcohol alkalies alloy anodic applications aromatic attack base bleaches brass carbon cast cause Cellulose Acetate chemical resistance chloride Coating common Company compounds concentration containing continuous copper Corp corrosion developer dilute dimensional stability DuPont effect elastomers environment Epoxy excellent fabrication Fe balance Fiber filter Flexible Glass grades graphic hardness heat Hypalon impact important increases Industries inhibitors iron lines machine material mechanical metal molding Nemours occurs organic oxidizing percent Phenolic photographic activity photographic processing equipment photographic processing solutions physical piping pitting plastics Polyester Polyethylene polymer Polypropylene Polyvinyl Chloride prior proper properties protective range ratio recommended Reinforced resins RR RR RR rubber satisfactory selection Silicone soften solvents stainless steel strength strong suitable sulfur surface Table tanks techniques Teflon temperature thermoplastic tions usually welding wide
Bibliographic information
| Title | Construction Materials for Photographic Processing Equipment Volume 12 of Kodak publication |
| Author | Eastman Kodak Company |
| Edition | 3, illustrated |
| Publisher | Eastman Kodak Company, 1980 |
| Original from | the University of Virginia |
| Digitized | 27 Jun 2008 |
| Length | 36 pages |
| Export Citation | BiBTeX EndNote RefMan |