Construction Materials for Photographic Processing Equipment |
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Page 11
To use Table III , first refer to the section headed “ Chemical and Photographic
Suitability " and then to the section “ Common Applications . " A common
application is possible only where the chemical and photographic suitability is
indicated by ...
To use Table III , first refer to the section headed “ Chemical and Photographic
Suitability " and then to the section “ Common Applications . " A common
application is possible only where the chemical and photographic suitability is
indicated by ...
Page 20
For special applications CTFE is available with 25 percent plasticizer included .
These materials should be tested for photographic inertness prior to their use in a
photographic process . Moisture absorption of CTFE is rated at zero , which ...
For special applications CTFE is available with 25 percent plasticizer included .
These materials should be tested for photographic inertness prior to their use in a
photographic process . Moisture absorption of CTFE is rated at zero , which ...
Page 25
Epoxies are finding increasing applications as surface coatings where corrosion
resistance is of prime consideration . The materials have found wide use as
encapsulants for electronic circuitry . In photographic applications , epoxy
cements ...
Epoxies are finding increasing applications as surface coatings where corrosion
resistance is of prime consideration . The materials have found wide use as
encapsulants for electronic circuitry . In photographic applications , epoxy
cements ...
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Acetate acids added AISI Type alcohol alkalies alloy anodic applications aromatic attack base bleaches brass carbon cast cause Cellulose Acetate chemical resistance chloride Coating common Company compounds concentration containing continuous copper Corp corrosion developer dilute dimensional stability DuPont effect elastomers environment Epoxy excellent fabrication Fe balance Fiber filter Flexible Glass grades graphic hardness heat Hypalon impact important increases Industries inhibitors iron lines machine material mechanical metal molding Nemours occurs organic oxidizing percent Phenolic photographic activity photographic processing equipment photographic processing solutions physical piping pitting plastics Polyester Polyethylene polymer Polypropylene Polyvinyl Chloride prior proper properties protective range ratio recommended Reinforced resins RR RR RR rubber satisfactory selection Silicone soften solvents stainless steel strength strong suitable sulfur surface Table tanks techniques Teflon temperature thermoplastic tions usually welding wide
Bibliographic information
| Title | Construction Materials for Photographic Processing Equipment Volume 12 of Kodak publication |
| Author | Eastman Kodak Company |
| Edition | 3, illustrated |
| Publisher | Eastman Kodak Company, 1980 |
| Original from | the University of Virginia |
| Digitized | 27 Jun 2008 |
| Length | 36 pages |
| Export Citation | BiBTeX EndNote RefMan |