Construction Materials for Photographic Processing Equipment |
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Page 9
The high silicon content ( 13 to 16 percent ) of these cast irons increases
chemical resistance , due to the formation of a passive SiO2 surface layer , which
forms on exposure to the environment . The material is very hard , which makes it
...
The high silicon content ( 13 to 16 percent ) of these cast irons increases
chemical resistance , due to the formation of a passive SiO2 surface layer , which
forms on exposure to the environment . The material is very hard , which makes it
...
Page 25
Chemical resistance of epoxies is generally high but is affected by the type of
hardener used ; aromatic amines are more resistant than the aliphatic amines .
Epoxy resins have good resistance to nonoxidizing acids and solvents , but
exhibit ...
Chemical resistance of epoxies is generally high but is affected by the type of
hardener used ; aromatic amines are more resistant than the aliphatic amines .
Epoxy resins have good resistance to nonoxidizing acids and solvents , but
exhibit ...
Page 27
Chemical resistance is good . This material is chemically inert to all acids and
alkalies and most solvents . The aromatic solvents do cause softening and
swelling , however . Kel - F does not produce any adverse sensitometric effects
when in ...
Chemical resistance is good . This material is chemically inert to all acids and
alkalies and most solvents . The aromatic solvents do cause softening and
swelling , however . Kel - F does not produce any adverse sensitometric effects
when in ...
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Acetate acids added AISI Type alcohol alkalies alloy anodic applications aromatic attack base bleaches brass carbon cast cause Cellulose Acetate chemical resistance chloride Coating common Company compounds concentration containing continuous copper Corp corrosion developer dilute dimensional stability DuPont effect elastomers environment Epoxy excellent fabrication Fe balance Fiber filter Flexible Glass grades graphic hardness heat Hypalon impact important increases Industries inhibitors iron lines machine material mechanical metal molding Nemours occurs organic oxidizing percent Phenolic photographic activity photographic processing equipment photographic processing solutions physical piping pitting plastics Polyester Polyethylene polymer Polypropylene Polyvinyl Chloride prior proper properties protective range ratio recommended Reinforced resins RR RR RR rubber satisfactory selection Silicone soften solvents stainless steel strength strong suitable sulfur surface Table tanks techniques Teflon temperature thermoplastic tions usually welding wide
Bibliographic information
| Title | Construction Materials for Photographic Processing Equipment Volume 12 of Kodak publication |
| Author | Eastman Kodak Company |
| Edition | 3, illustrated |
| Publisher | Eastman Kodak Company, 1980 |
| Original from | the University of Virginia |
| Digitized | 27 Jun 2008 |
| Length | 36 pages |
| Export Citation | BiBTeX EndNote RefMan |