Construction Materials for Photographic Processing Equipment |
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Page 16
... compounds tend to desensitize photographic emulsions in the developer and the predeveloper steps of photographic processing . The amount of desensitization will depend on the type and amount of sulfur compound and on the process in ...
... compounds tend to desensitize photographic emulsions in the developer and the predeveloper steps of photographic processing . The amount of desensitization will depend on the type and amount of sulfur compound and on the process in ...
Page 20
... compounds . They are resistant to most organic solvents except certain halogenated hydrocarbons and oxygen - containing compounds . CTFE is resistant to photographic pro- cessing solutions , and the non - plasticized material is ...
... compounds . They are resistant to most organic solvents except certain halogenated hydrocarbons and oxygen - containing compounds . CTFE is resistant to photographic pro- cessing solutions , and the non - plasticized material is ...
Page 25
... compound are affected markedly by the type of filler , which may be as much as 40 percent by weight of the final ... compounds tend to desensitize , but may also fog photographic products . Some commercial rubbers are classified as ...
... compound are affected markedly by the type of filler , which may be as much as 40 percent by weight of the final ... compounds tend to desensitize , but may also fog photographic products . Some commercial rubbers are classified as ...
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Acetate acids added AISI Type alcohol alkalies alloy anodic applications aromatic attack base bleaches brass carbon cast cause Cellulose Cellulose Acetate chemical resistance chloride Coating common Company compounds concentration construction materials containing continuous copper corrosion developer dilute dimensional stability DuPont effect elastomers environment Epoxy excellent fabrication Fe balance Fiber filter Flexible Glass grades graphic hardness heat Hypalon impact important increases Industries inhibitors iron lines machine material mechanical metal molding Nemours occurs organic oxidizing percent Phenolic photographic activity photographic processing equipment photographic processing solutions physical piping pitting plastics Polyester Polyethylene polymer Polypropylene Polyvinyl Chloride prior problems proper properties protective range ratio recommended Reinforced resins rubber satisfactory selection Silicone soften solvents stainless steel strength strong suitable sulfur surface Table tanks techniques Teflon temperature thermoplastic tions usually welding wide