Polymers in Microlithography: Materials and ProcessesThis volume examines the role polymeric materials play in the electronics industry, with special emphasis on recent advances in the science and technology of resist materials and processing for microlithography. It provides the reader with an appreciation for the diversity of chemical research efforts that are required for the development of new resist materials and processes. Its 26 chapters are divided into three sections covering chemically applied resist chemistry, multilevel resist chemistry and processing, and novel chemistry and processes for microlithography. Each section contains an introduction written by a recognized expert in the field. |
Contents
Brönsted Acid Generation from Triphenylsulfonium | 27 |
Effect of Polymer | 39 |
Copolymer Approach to Design of Sensitive | 57 |
Copyright | |
21 other sections not shown
Common terms and phrases
ablation absorbance absorption acid American Chemical Society anthracene aqueous aromatic baking CH₂ chain Chem chemistry concentration copolymer crosslinking curve deep UV diazonium salts diffusion dissolution dose electron etching rate excimer laser exposure film thickness fluence fluorescence flux groups hydrophilic imaging increase intensity irradiation kinetics KrF excimer laser layer lithography materials measured methacrylate mJ/cm² molecular weight monomer novolac o-cresol O2 RIE obtained oxide thickness oxygen PATE pattern PDMSX phenolic photochemical photolysis Photopolymers photoresist Phys planarizing plasma PMMA PMMA film polymer polymer films polymerization polysilane polystyrene positive photoresist postbake Proc quantum yield radiation radical reaction reactive ion etching Reichmanis resin resist film resist systems resolution salt scission sensitivity shown in Figure silicon siloxane solubility solution solvent spectra SPIE spin coating structure styrene substrate surface Technol temperature thermal thymine TiCl4 TMAH tosylate triphenylsulfonium wafer wavelength X-ray