Low-Dielectric Constant Materials-Synthesis and Applications in Microelectronics: Symposium Held April 17-19, 1995, San Francisco, California, U.S.A. |
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Page 135
This paper presents capacitance values measured over a wide range of temperature , and a summary of the measured ... dielectric properties were determined by MIM ( Metal - Insulator - Metal ) measurements , and the horizontal ( in ...
This paper presents capacitance values measured over a wide range of temperature , and a summary of the measured ... dielectric properties were determined by MIM ( Metal - Insulator - Metal ) measurements , and the horizontal ( in ...
Page 157
The technique is attractive since it is relatively broadband and can be used for measurements of thin materials in the 10-100 GHz band . Measurements on dielectric thin - film anisotropy are given in ( 37 ) .
The technique is attractive since it is relatively broadband and can be used for measurements of thin materials in the 10-100 GHz band . Measurements on dielectric thin - film anisotropy are given in ( 37 ) .
Page 163
[ 20 ] H. Tanaka and F. Okada , “ Precise measurements of dissipation factor in microwave printed circuit boards , ” IEEE Trans . Instrum . Meas . , vol . IM - 38 , pp . 509-514 , April 1989 . [ 21 ] J. Murray Olyphant and J. H. Ball ...
[ 20 ] H. Tanaka and F. Okada , “ Precise measurements of dissipation factor in microwave printed circuit boards , ” IEEE Trans . Instrum . Meas . , vol . IM - 38 , pp . 509-514 , April 1989 . [ 21 ] J. Murray Olyphant and J. H. Ball ...
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Contents
VaMethods | 3 |
Fluorinated Low Thermal Expansion Coefficient Polyimides | 19 |
Investigations of the Low Dielectric Constant Fluorinated | 31 |
Copyright | |
21 other sections not shown
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absorption addition adhesion aerogels alternating annealing applications bond bulk capacitance chemical circuit coating coefficient compared copolyimide copolymer copper cured decrease defects density deposition determined device dielectric properties effect electrical electronic energy etch field Figure film thickness fluorinated frequency function glass higher IEEE imaging improve in-plane increase indicate initial integrated interconnect interlayer dielectric layer light loss low dielectric constant lower materials measurements mechanical metal method microelectronic Microwave modulus moisture monomers observed obtained optical organic oxide Parylene patterns performance permittivity planarization plasma polishing polyimide film polymer polymeric prepared properties range reduce requirements Research resistance resonators sample shown in Figure shows silica silicon SiO2 SOG film solution stress structure studied substrate surface Table technique Technology Teflon temperature thermal thermal stability thickness thin films values vapor various Volume wafer
Bibliographic information
| Title | Low-Dielectric Constant Materials-Synthesis and Applications in Microelectronics: Symposium Held April 17-19, 1995, San Francisco, California, U.S.A. Materials Research Society symposia proceedings, ISSN 0272-9172 Volume 381 of Materials Research Society: Materials Research Society symposia proceedings |
| Editor | Toh-Ming Lu |
| Publisher | Materials Research Society, 1995 |
| Original from | the University of Michigan |
| Digitized | 10 Dec 2007 |
| ISBN | 1558992847, 9781558992849 |
| Length | 288 pages |
| Subjects | › › Technology & Engineering / Electronics / General |
| Export Citation | BiBTeX EndNote RefMan |