Low-Dielectric Constant Materials-Synthesis and Applications in Microelectronics: Symposium Held April 17-19, 1995, San Francisco, California, U.S.A. |
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Page 46
Because of this need , producing a thin film with all the demanded properties , we have initiated research in two directions ... Chemical vapor deposition has been one of the preferred processes for generating thin films of inorganic ...
Because of this need , producing a thin film with all the demanded properties , we have initiated research in two directions ... Chemical vapor deposition has been one of the preferred processes for generating thin films of inorganic ...
Page 49
1 The CVD system for deposition of PNT - N and PNT - F films a Conclusions : The main objective of our research is to find new precursors and new techniques to vapor deposit thin films of organic polymer with very low dielectric ...
1 The CVD system for deposition of PNT - N and PNT - F films a Conclusions : The main objective of our research is to find new precursors and new techniques to vapor deposit thin films of organic polymer with very low dielectric ...
Page 165
DIGITAL OPTICAL IMAGING OF BENZOCYCLOBUTENE ( BCB ) THIN FILMS ON SILICON WAFERS Robert A. DeVries , Reed A. Shick , and Bethany K. Johnson The Dow Chemical Company , 677 Bldg , Midland , MI 48667 ABSTRACT A practical , low - cost ...
DIGITAL OPTICAL IMAGING OF BENZOCYCLOBUTENE ( BCB ) THIN FILMS ON SILICON WAFERS Robert A. DeVries , Reed A. Shick , and Bethany K. Johnson The Dow Chemical Company , 677 Bldg , Midland , MI 48667 ABSTRACT A practical , low - cost ...
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Contents
VaMethods | 3 |
Fluorinated Low Thermal Expansion Coefficient Polyimides | 19 |
Investigations of the Low Dielectric Constant Fluorinated | 31 |
Copyright | |
21 other sections not shown
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Common terms and phrases
absorption addition adhesion aerogels alternating annealing applications bond bulk capacitance chemical circuit coating coefficient compared copolyimide copolymer copper cured decrease defects density deposition determined device dielectric properties effect electrical electronic energy etch field Figure film thickness fluorinated frequency function glass higher IEEE imaging improve in-plane increase indicate initial integrated interconnect interlayer dielectric layer light loss low dielectric constant lower materials measurements mechanical metal method microelectronic Microwave modulus moisture monomers observed obtained optical organic oxide Parylene patterns performance permittivity planarization plasma polishing polyimide film polymer polymeric prepared properties range reduce requirements Research resistance resonators sample shown in Figure shows silica silicon SiO2 SOG film solution stress structure studied substrate surface Table technique Technology Teflon temperature thermal thermal stability thickness thin films values vapor various Volume wafer
Bibliographic information
| Title | Low-Dielectric Constant Materials-Synthesis and Applications in Microelectronics: Symposium Held April 17-19, 1995, San Francisco, California, U.S.A. Materials Research Society symposia proceedings, ISSN 0272-9172 Volume 381 of Materials Research Society: Materials Research Society symposia proceedings |
| Editor | Toh-Ming Lu |
| Publisher | Materials Research Society, 1995 |
| Original from | the University of Michigan |
| Digitized | 10 Dec 2007 |
| ISBN | 1558992847, 9781558992849 |
| Length | 288 pages |
| Subjects | › › Technology & Engineering / Electronics / General |
| Export Citation | BiBTeX EndNote RefMan |