Low-dielectric Constant Materials-synthesis and Applications in Microelectronics: Symposium Held April 17-19, 1995, San Francisco, California, U.S.A.Toh-Ming Lu |
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Page 19
... transition temperature and the mechanical modulus at temperatures in excess of the glass transition . INTRODUCTION Over the past several years we have been reporting our work in the area of fluorinated polyimides for electronic ...
... transition temperature and the mechanical modulus at temperatures in excess of the glass transition . INTRODUCTION Over the past several years we have been reporting our work in the area of fluorinated polyimides for electronic ...
Page 147
... TRANSITION TEMPERATURE OF ULTRATHIN POLYMER FILMS ON SILICON WEN - LI WU , WILLIAM E. WALLACE AND JOHN VAN ZANTEN Polymers Division , NIST , Gaithersburg , MD 20899 ABSTRACT The glass transition temperature , T. , of polystyrene ( PS ) ...
... TRANSITION TEMPERATURE OF ULTRATHIN POLYMER FILMS ON SILICON WEN - LI WU , WILLIAM E. WALLACE AND JOHN VAN ZANTEN Polymers Division , NIST , Gaithersburg , MD 20899 ABSTRACT The glass transition temperature , T. , of polystyrene ( PS ) ...
Page 148
... transition temperature measured for polystyrene in the bulk , 104 ° C [ 10 ] . The films with initial film thicknesses of 264 Å and above display little change with temperature until approximately 60 ° C , where they begin to expand ...
... transition temperature measured for polystyrene in the bulk , 104 ° C [ 10 ] . The films with initial film thicknesses of 264 Å and above display little change with temperature until approximately 60 ° C , where they begin to expand ...
Contents
Methods | 3 |
Fluorinated Low Thermal Expansion Coefficient Polyimides | 19 |
Vapor Deposition of Very Low K Polymer Films | 45 |
Copyright | |
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1995 Materials Research absorption annealing applications bond BPDA-PDA bulk c-BN capacitance chemical vapor deposition circuit coating copolymer copper cured decrease density device dielectric film dielectric properties electrode electromigration FAST-SOG films film thickness films deposited fluorinated fluorinated polyimide frequency FTIR glass transition temperature h-BN helicon reactor IEEE Trans in-plane increase insulating integrated integrated circuits interlayer dielectric layer leakage current low dielectric constant lower Materials Research Society measured mechanical properties metal microelectronics Microwave modulus moisture monomers multilevel interconnections optical organic polymers oxide Parylene patterns PECVD permittivity planarization plasma plasma treatment polish rate polyimide polyimide film polymeric materials pore Proc refractive index resin resistance resonators RTCVD-SiOF sample shown in Figure Si-O-Si silica aerogels siloxane SiO2 SiO2 film slurry SOG film solvent spin-coated spin-on stress substrate surface Table technique Technology TEOS/O test structure thermal stability thin films ULSI vapor deposition wet etch