Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
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Page 464
... halogen lamp Fig . 10. Schematic diagram of a photochemical vapor deposition reactor for the growth of CdTe and HgTe epitaxial films . In this arrangement , the optical source is a 1,000 W Hg - Xe arc lamp whose spectrum is modified by ...
... halogen lamp Fig . 10. Schematic diagram of a photochemical vapor deposition reactor for the growth of CdTe and HgTe epitaxial films . In this arrangement , the optical source is a 1,000 W Hg - Xe arc lamp whose spectrum is modified by ...
Page 471
... halogen lamp also generates a blackbody spectrum , but its low color temperature results in weak output below 350 nm , the region where the majority of precursors of interest to photo - CVD absorb . Shorter - wavelength ( VUV ) lamps ...
... halogen lamp also generates a blackbody spectrum , but its low color temperature results in weak output below 350 nm , the region where the majority of precursors of interest to photo - CVD absorb . Shorter - wavelength ( VUV ) lamps ...
Page 703
... halogen - deficient ( F / C < = 2 ) . As was described earlier ( IV , B , 3 , a ) , a useful feature of such a halogen deficient plasma is the large selectivity that can be obtained for oxide systems . If these polymers are mainly ...
... halogen - deficient ( F / C < = 2 ) . As was described earlier ( IV , B , 3 , a ) , a useful feature of such a halogen deficient plasma is the large selectivity that can be obtained for oxide systems . If these polymers are mainly ...
Contents
Processing Plasmas | 16 |
rf Diode Plasmas | 24 |
Afterglow Plasmas | 37 |
Copyright | |
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alloy anode Appl applications AsH3 atoms chamber chemical chemical vapor deposition coatings composition compound Crystal Growth density deposition process deposition rate device dielectric dopant doping effects Electrochem emission epitaxial etch rate evaporation excitation film deposition flow flux GaAs gas-phase gases glow discharge grid growth rate heater heating increase ion beam ion bombardment ion energy ion source ionization kinetic laser layer Lett LPCVD magnetic field magnetron material metal molecules nitride OMVPE optical oxide particle PECVD photochemical photodeposition photon photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reaction reactor region remote PECVD semiconductor shown in Fig SiH4 silane silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering stoichiometric substrate substrate temperature surface susceptor target techniques Technol Technology thermal thickness thin film Thin Solid Films tion torr typically vacuum voltage wafer wavelength