Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
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Page 91
... heater Chromel and Cb . Ni , Fe , Fe - crucible Nichrome conical basket Carbon 3700 ± 100 2,681 heater Pointed carbon Resistance rods pressed heating together Cerium 785 1,305 Chromium 1,900 1,205 W , conical basket Cobalt 1,478 649 Cb ...
... heater Chromel and Cb . Ni , Fe , Fe - crucible Nichrome conical basket Carbon 3700 ± 100 2,681 heater Pointed carbon Resistance rods pressed heating together Cerium 785 1,305 Chromium 1,900 1,205 W , conical basket Cobalt 1,478 649 Cb ...
Page 93
... heater Magnesium 651 443 ( sublimes ) W , Ni , Fe , Ta , Mo Ta Iron crucible ; External Mo , Cb , carbon Nichrome Chromel , heater conical Resistance heater basket W , Ta , Mo , Does not melt when volatilized from open spirals and boats ...
... heater Magnesium 651 443 ( sublimes ) W , Ni , Fe , Ta , Mo Ta Iron crucible ; External Mo , Cb , carbon Nichrome Chromel , heater conical Resistance heater basket W , Ta , Mo , Does not melt when volatilized from open spirals and boats ...
Page 94
... heater or basket radiant heater Remarks Very volatile , may contaminate plant . Wets filament metals quoted . Strontium 771 549 W , Ta , Mo , Carbon Cb , conical basket Resistance- heated Freely wets without alloying with all filament ...
... heater or basket radiant heater Remarks Very volatile , may contaminate plant . Wets filament metals quoted . Strontium 771 549 W , Ta , Mo , Carbon Cb , conical basket Resistance- heated Freely wets without alloying with all filament ...
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Common terms and phrases
alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound semiconductors compounds Crystal Growth CVD reactors density deposition process deposition rate device dielectric diffusion dopant doping effects Electrochem electron emission epitaxial etch rate film deposition flux GaAs gas-phase gases glow discharge grid growth rate heating increase ion beam ion bombardment ion energy ion source ionization K. F. Jensen kinetics laser layer Lett LPCVD magnetic field magnetron material metal mtorr nitride nucleation OMVPE optical oxide particle PECVD photochemical photodeposition photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reactive region remote PECVD semiconductor SiH4 silane silicides silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering substrate substrate temperature susceptor target techniques Technol Technology thermal thin films Thin Solid Films tion torr typically vacuum voltage wafer wavelength