Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
From inside the book
Results 1-3 of 55
Page 446
... laser is shown irradiating the substrate , films are often grown with the optical beam directed parallel to the surface ( adapted from Ref ... Laser evaporation # Laser chemical vapor deposition Laser photodeposition Laser 446 J. G. EDEN.
... laser is shown irradiating the substrate , films are often grown with the optical beam directed parallel to the surface ( adapted from Ref ... Laser evaporation # Laser chemical vapor deposition Laser photodeposition Laser 446 J. G. EDEN.
Page 447
John L. Vossen, Werner Kern. Laser evaporation # Laser chemical vapor deposition Laser photodeposition Laser - enhanced electroplating Fig . 2. Schematic representations of the various methods available for the laser - assisted ...
John L. Vossen, Werner Kern. Laser evaporation # Laser chemical vapor deposition Laser photodeposition Laser - enhanced electroplating Fig . 2. Schematic representations of the various methods available for the laser - assisted ...
Page 826
... laser pulse , acoustic [ 161 , 163 , 164 ] and / or capillary ( surface tension ) [ 161 , 164 ] waves are established in the molten region . If the resoli- dification ... Laser-Driven Etching Applications of Laser-Driven Etching A Polymers.
... laser pulse , acoustic [ 161 , 163 , 164 ] and / or capillary ( surface tension ) [ 161 , 164 ] waves are established in the molten region . If the resoli- dification ... Laser-Driven Etching Applications of Laser-Driven Etching A Polymers.
Contents
Processing Plasmas | 16 |
rf Diode Plasmas | 24 |
Afterglow Plasmas | 37 |
Copyright | |
34 other sections not shown
Other editions - View all
Common terms and phrases
alloy anode Appl applications AsH3 atoms chamber chemical chemical vapor deposition coatings composition compound Crystal Growth density deposition process deposition rate device dielectric dopant doping effects Electrochem emission epitaxial etch rate evaporation excitation film deposition flow flux GaAs gas-phase gases glow discharge grid growth rate heater heating increase ion beam ion bombardment ion energy ion source ionization kinetic laser layer Lett LPCVD magnetic field magnetron material metal molecules nitride OMVPE optical oxide particle PECVD photochemical photodeposition photon photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reaction reactor region remote PECVD semiconductor shown in Fig SiH4 silane silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering stoichiometric substrate substrate temperature surface susceptor target techniques Technol Technology thermal thickness thin film Thin Solid Films tion torr typically vacuum voltage wafer wavelength