Thin film processes IIThis sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application |
From inside the book
Results 1-3 of 75
Page 39
A moving charge in a magnetic field is subject to a force Fm = qvxB, (6.1) where q
is the charge on the particle, v is the velocity, and B is the magnetic field. For a
charged particle moving at right angles to a magnetic field, this force will cause ...
A moving charge in a magnetic field is subject to a force Fm = qvxB, (6.1) where q
is the charge on the particle, v is the velocity, and B is the magnetic field. For a
charged particle moving at right angles to a magnetic field, this force will cause ...
Page 40
The frequency of rotation of a given particle in a magnetic field can also be easily
found as w = qB/m, (6.4) where w is the rotational speed in radians/s. This
frequency is known as the cyclotron frequency. It is interesting to note that this
relation ...
The frequency of rotation of a given particle in a magnetic field can also be easily
found as w = qB/m, (6.4) where w is the rotational speed in radians/s. This
frequency is known as the cyclotron frequency. It is interesting to note that this
relation ...
Page 303
Direct observations of flow phenomena are typically made by smoke trade
studies using light scattering by TiO2 particles generated by reacting TiCU with
water vapor. This technique has been used to visualize axisym- metric [192,201]
and ...
Direct observations of flow phenomena are typically made by smoke trade
studies using light scattering by TiO2 particles generated by reacting TiCU with
water vapor. This technique has been used to visualize axisym- metric [192,201]
and ...
What people are saying - Write a review
We haven't found any reviews in the usual places.
Other editions - View all
Common terms and phrases
alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound Crystal Growth density deposition rate device dielectric dopant doping effects Electrochem emission epitaxial etch rate evaporation excitation film deposition flow flux GaAs gas-phase gases glow discharge growth rate heater heating increase ion beam ion bombardment ion energy ion source ionization kinetic laser layer Lett LPCVD magnetic field magnetron material metal molecules nitride OMVPE optical oxide particle PECVD photochemical photodeposition photon photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reaction reactor refractory metal region remote PECVD RHEED semiconductor shown in Fig SiH4 silane silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering structure substrate substrate temperature susceptor target techniques Technol Technology thermal thickness thin film Thin Solid Films tion torr typically vacuum voltage wafer wavelength
Bibliographic information
| Title | Thin film processes II Volume 2 of Thin Film Processes, Werner Kern |
| Authors | John L. Vossen, Werner Kern |
| Editors | John L. Vossen, Werner Kern |
| Edition | illustrated |
| Publisher | Academic Press, 1991 |
| Original from | the University of Michigan |
| Digitized | 10 Dec 2007 |
| ISBN | 0127282513, 9780127282510 |
| Length | 866 pages |
| Subjects | › › Electronic books Science / Physics Technology & Engineering / Electronics / Semiconductors Technology & Engineering / Material Science Thin film devices Thin films |
| Export Citation | BiBTeX EndNote RefMan |