Thin Film Processes, Volume 2John L. Vossen, Werner Kern Academic Press, 1978 - Thin films |
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Page 444
... photodeposition of films often permits operation at lower temper- atures , where impurity redistribution and thermally induced mechanical stress are minimized . Other attractive aspects of photo - CVD include the capability for ...
... photodeposition of films often permits operation at lower temper- atures , where impurity redistribution and thermally induced mechanical stress are minimized . Other attractive aspects of photo - CVD include the capability for ...
Page 476
... PHOTODEPOSITED WITH A KRF Laser ( 248 nm ) from Metal HexacarbONYL PRECURSOrs ( after Ref . 49 ) Deposition rate ( Å ... photodeposition of molybdenum , but the results are comparable to those obtained for Cr and W. Gilgen et al . [ 52 ] ...
... PHOTODEPOSITED WITH A KRF Laser ( 248 nm ) from Metal HexacarbONYL PRECURSOrs ( after Ref . 49 ) Deposition rate ( Å ... photodeposition of molybdenum , but the results are comparable to those obtained for Cr and W. Gilgen et al . [ 52 ] ...
Page 485
... photodeposition studies reported to date have relied upon the alkyls as sources for one or both of the Column IIB and VIA atoms . The first photodeposited epitaxial II - VI film , HgTe , was grown by Irvine and co - workers [ 94 ] from ...
... photodeposition studies reported to date have relied upon the alkyls as sources for one or both of the Column IIB and VIA atoms . The first photodeposited epitaxial II - VI film , HgTe , was grown by Irvine and co - workers [ 94 ] from ...
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alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound semiconductors compounds Crystal Growth CVD reactors density deposition process deposition rate device dielectric diffusion dopant doping effects Electrochem electron emission epitaxial etch rate film deposition flux GaAs gas-phase gases glow discharge grid growth rate heating increase ion beam ion bombardment ion energy ion source ionization K. F. Jensen kinetics laser layer Lett LPCVD magnetic field magnetron material metal mtorr nitride nucleation OMVPE optical oxide particle PECVD photochemical photodeposition photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reactive region remote PECVD semiconductor SiH4 silane silicides silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering substrate substrate temperature susceptor target techniques Technol Technology thermal thin films Thin Solid Films tion torr typically vacuum voltage wafer wavelength