Thin Film Processes, Volume 2 |
From inside the book
Results 1-3 of 74
Page 297
7 Schmidt mean free path characteristic length momentum diffusivity thermal
diffusivity momentum diffusivity mass diffusivity momentum flux by convection
momentum flux by diffusion thermal flux by convection thermal flux by diffusion 1 -
10 ...
7 Schmidt mean free path characteristic length momentum diffusivity thermal
diffusivity momentum diffusivity mass diffusivity momentum flux by convection
momentum flux by diffusion thermal flux by convection thermal flux by diffusion 1 -
10 ...
Page 838
Thermal , gas - or liquid - phase photochemical , and carrier - driven
photochemical processes have also been employed . In many cases , the
mechanism of a laser - driven etching process is a combination of these
mechanisms . Many of the ...
Thermal , gas - or liquid - phase photochemical , and carrier - driven
photochemical processes have also been employed . In many cases , the
mechanism of a laser - driven etching process is a combination of these
mechanisms . Many of the ...
Page 844
etched using the laser to enhance a thermal reaction ( 266 ) , and borosilicate
glass has been etched using laser generation of CF2 ( 275 ) . Laser heating has
been used to increase the reaction of sapphire with plasma - generated reactants
...
etched using the laser to enhance a thermal reaction ( 266 ) , and borosilicate
glass has been etched using laser generation of CF2 ( 275 ) . Laser heating has
been used to increase the reaction of sapphire with plasma - generated reactants
...
What people are saying - Write a review
We haven't found any reviews in the usual places.
Contents
ROSSNAGEL | 12 |
rf Diode Plasmas | 24 |
Plasmas in the Presence of Magnetic Fields | 39 |
Copyright | |
25 other sections not shown
Other editions - View all
Common terms and phrases
addition alloy Appl applications atoms beam cathode chamber charge chemical coatings composition compound contamination Crystal density dependent deposition rate developed device direct discharge discussed effects electric Electrochem electron energy epitaxial etching evaporation example excitation film deposition flow flux formation function GaAs gases geometry growth heating higher important increase ionization laser layer lead Lett limited lower magnetic field magnetron material measured mechanism metal method observed obtained occurs operation optical oxide particle PECVD phase Phys Physics plasma potential precursor present pressure produce properties pump range ratio reaction reactive reactor reduced region relatively resistivity sample selective semiconductor shown silicon similar SiO2 Solid species sputtering structure studies substrate surface techniques Technol Technology temperature thermal thickness thin film tion typically uniformity vacuum voltage wafer