Thin film processes IIThis sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application |
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Page 297
TABLE II DlMENSIONLESS PARAMETER GROUPS IN CVD Name Definition
Physical interpretation Typical order of magnitude Knudsen Prandtl Schmidt
Reynolds Peclet (thermal) Damkohler (gas phase) Damkohler (surface) V Pr = - a
Sc ...
TABLE II DlMENSIONLESS PARAMETER GROUPS IN CVD Name Definition
Physical interpretation Typical order of magnitude Knudsen Prandtl Schmidt
Reynolds Peclet (thermal) Damkohler (gas phase) Damkohler (surface) V Pr = - a
Sc ...
Page 838
However, laser ablation is currently used commercially for link breaking. Thermal,
gas- or liquid-phase photochemical, and carrier-driven photochemical processes
have also been employed. In many cases, the mechanism of a laser-driven ...
However, laser ablation is currently used commercially for link breaking. Thermal,
gas- or liquid-phase photochemical, and carrier-driven photochemical processes
have also been employed. In many cases, the mechanism of a laser-driven ...
Page 844
etched using the laser to enhance a thermal reaction [266] , and borosilicate
glass has been etched using laser generation of CF2 [275]. Laser heating has
been used to increase the reaction of sapphire with plasma-generated reactants [
266].
etched using the laser to enhance a thermal reaction [266] , and borosilicate
glass has been etched using laser generation of CF2 [275]. Laser heating has
been used to increase the reaction of sapphire with plasma-generated reactants [
266].
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Common terms and phrases
alloy anode Appl applications AsH3 atoms cathode chamber chemical chemical vapor deposition coatings composition compound Crystal Growth density deposition rate device dielectric dopant doping effects Electrochem emission epitaxial etch rate evaporation excitation film deposition flow flux GaAs gas-phase gases glow discharge growth rate heater heating increase ion beam ion bombardment ion energy ion source ionization kinetic laser layer Lett LPCVD magnetic field magnetron material metal molecules nitride OMVPE optical oxide particle PECVD photochemical photodeposition photon photoresist Phys plasma plasma etching potential precursor pressure Proc produce pump ratio reactants reaction reactor refractory metal region remote PECVD RHEED semiconductor shown in Fig SiH4 silane silicon silicon nitride SiO2 sol-gel species sputter deposition sputtering structure substrate substrate temperature susceptor target techniques Technol Technology thermal thickness thin film Thin Solid Films tion torr typically vacuum voltage wafer wavelength
Bibliographic information
| Title | Thin film processes II Volume 2 of Thin Film Processes, Werner Kern |
| Authors | John L. Vossen, Werner Kern |
| Editors | John L. Vossen, Werner Kern |
| Edition | illustrated |
| Publisher | Academic Press, 1991 |
| Original from | the University of Michigan |
| Digitized | 10 Dec 2007 |
| ISBN | 0127282513, 9780127282510 |
| Length | 866 pages |
| Subjects | › › Electronic books Science / Physics Technology & Engineering / Electronics / Semiconductors Technology & Engineering / Material Science Thin film devices Thin films |
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