Thin Film Processes, Volume 1
John L. Vossen, Werner Kern
Academic Press, 1978 - Technology & Engineering - 564 pages
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.
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Glow Discharge Sputter Deposition
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