Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 276
... Epitaxial growth is a desirable feature in CVD films , because epitaxial films frequently have superior charactertistics in comparison with either polycrystalline or amorphous films . When an epitaxial film grows on the substance of the ...
... Epitaxial growth is a desirable feature in CVD films , because epitaxial films frequently have superior charactertistics in comparison with either polycrystalline or amorphous films . When an epitaxial film grows on the substance of the ...
Page 310
... Epitaxial Single - crystal [ 280 , 281 ] Si wafer Si SiCl2H , H2 ~ 1150 Epitaxial Si wafer Si SiCh2H2 , H2 1100 Epitaxial Si wafer Si SiH4 , H2 1050 Epitaxial Single - crystal [ 280 , 281 ] Single - crystal [ 282 ] Single - crystal ...
... Epitaxial Single - crystal [ 280 , 281 ] Si wafer Si SiCl2H , H2 ~ 1150 Epitaxial Si wafer Si SiCh2H2 , H2 1100 Epitaxial Si wafer Si SiH4 , H2 1050 Epitaxial Single - crystal [ 280 , 281 ] Single - crystal [ 282 ] Single - crystal ...
Page 311
... Epitaxial Sapphire [ 296 ] AIP AL , HCI , PH3 , H2 1200 Epitaxial Si [ 297 ] AIAS Al , HCl , AsH3 , H2 1000 Epitaxial GaAs [ 298 ] AlAs ( CH3 ) 3Al , AsH3 , H2 700 Epitaxial GaAs [ 299 ] GaN Ga , HCI , NH3 , H2 850 Epitaxial Sapphire ...
... Epitaxial Sapphire [ 296 ] AIP AL , HCI , PH3 , H2 1200 Epitaxial Si [ 297 ] AIAS Al , HCl , AsH3 , H2 1000 Epitaxial GaAs [ 298 ] AlAs ( CH3 ) 3Al , AsH3 , H2 700 Epitaxial GaAs [ 299 ] GaN Ga , HCI , NH3 , H2 850 Epitaxial Sapphire ...
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Å/min alloys anode Appl argon atoms cathode chemical coatings compounds current density cylindrical-post magnetron deposition rate effect elec electric Electrochem electroless electrolytic electroplating energy Epitaxial erosion etch rate etchants etching field lines film deposition flow gas pressure gases glow discharge glow discharge polymerization H₂ H₂O heating increase ion beam deposition ion bombardment ion source ionization J. A. Thornton layer mA/cm² magnetic field magnetron magnetron sputtering material metal mTorr N₂ negative neutral nitride O₂ operation oxide Phys planar magnetron plasma plating PM sputtering polymer potential power density power supply Proc reaction reactive gas reactive sputtering reactor region secondary electrons Section semiconductor shown in Fig silicon SiO2 solution sputter deposition Sputter Gun sputter yield sputtering gas stoichiometry substrate target surface Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage York