Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
From inside the book
Results 1-3 of 84
Page 62
... thin films as desired . However , the sheer number of critical process parameters and their complex interrelationships can often make these processes difficult to control . For many applications , the advantages far outweigh the disad ...
... thin films as desired . However , the sheer number of critical process parameters and their complex interrelationships can often make these processes difficult to control . For many applications , the advantages far outweigh the disad ...
Page 71
... Thin Solid Films 9 , 341 ( 1972 ) . 364. S. Yamanaka and T. Oohashi , Jpn . J. Appl . Phys . 8 , 1058 ( 1969 ) . 365. D. Gerstenberg and C. J. Calbick , J. Appl . Phys . 35 , 402 ( 1964 ) . 366. D. Gerstenberg , J. Electrochem . Soc ...
... Thin Solid Films 9 , 341 ( 1972 ) . 364. S. Yamanaka and T. Oohashi , Jpn . J. Appl . Phys . 8 , 1058 ( 1969 ) . 365. D. Gerstenberg and C. J. Calbick , J. Appl . Phys . 35 , 402 ( 1964 ) . 366. D. Gerstenberg , J. Electrochem . Soc ...
Page 72
... Thin Solid Films 8 , 245 ( 1971 ) . 407. K. G. Geraghty and L. F. Donaghey , Thin Solid Films 40 , 375 ( 1977 ) . 408. J. Duchene , M. Terraillon , and M. Pailly , Thin Solid Films 12 , 231 ( 1972 ) . 409. R. M. Goldstein and S. C. ...
... Thin Solid Films 8 , 245 ( 1971 ) . 407. K. G. Geraghty and L. F. Donaghey , Thin Solid Films 40 , 375 ( 1977 ) . 408. J. Duchene , M. Terraillon , and M. Pailly , Thin Solid Films 12 , 231 ( 1972 ) . 409. R. M. Goldstein and S. C. ...
Contents
Glow Discharge Sputter Deposition | 13 |
Equipment Configuration | 31 |
Preconditioning of Targets Substrates and Systems for Film | 41 |
Copyright | |
10 other sections not shown
Other editions - View all
Common terms and phrases
Å/min alloys anode Appl applications argon atoms bias bombardment cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition flow rate GaAs gases glow discharge polymerization H₂ H₂O heating HNO3 increase ion beam deposition ion source ionization layer mA/cm² magnetic field magnetron mask metal mTorr N₂ nitride O₂ operation oxide photoresist Phys planar plasma plasma etching plating PM sputtering polishing polymer polymer deposition potential pressure Proc produce ratio reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon silicon nitride SiO2 solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York µm/min