Thin film processes, Volume 1Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 362
Polymer formation that occurs in such a process is generally referred to as
plasma polymerization or glow discharge polymerization. The recognition of thin
film formation by glow discharge polymerization can be traced back to 1874 [1, 2].
Polymer formation that occurs in such a process is generally referred to as
plasma polymerization or glow discharge polymerization. The recognition of thin
film formation by glow discharge polymerization can be traced back to 1874 [1, 2].
Page 363
In a strict sense, polymerization in the conventional context does not represent
the process of polymer formation that occurs in a glow discharge — although
such polymerization may play a role, depending on the chemical structure of a ...
In a strict sense, polymerization in the conventional context does not represent
the process of polymer formation that occurs in a glow discharge — although
such polymerization may play a role, depending on the chemical structure of a ...
Page 373
D. Discharge Power The significance of discharge power in glow discharge
polymerization is quite different from that for nonpolymer-forming plasmas. In
essence, (the absolute value of) discharge power itself cannot be considered as
an ...
D. Discharge Power The significance of discharge power in glow discharge
polymerization is quite different from that for nonpolymer-forming plasmas. In
essence, (the absolute value of) discharge power itself cannot be considered as
an ...
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Contents
Glow Discharge Sputter Deposition | 12 |
Glow Discharges | 24 |
Equipment Configuration | 31 |
Copyright | |
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Common terms and phrases
A/min Abstr alloys anode Appl applications argon atoms bias cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial Epitaxial Epitaxial Epitaxial etch rate etchant etching processes film deposition flow rate GaAs gases glow discharge polymerization heating increase ion beam deposition ion source ionization Kern layer magnetic field magnetron mask metal mTorr operation oxide photoresist Phys plasma etching plating PM sputtering polishing polymer polymer deposition potential power density power supply pressure Proc produce ratio RCA Rev reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon nitride solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York
Bibliographic information
| Title | Thin film processes, Volume 1 Thin Film Processes, Werner Kern |
| Author | John L. Vossen |
| Editors | John L. Vossen, Werner Kern |
| Edition | 8, illustrated |
| Publisher | Academic Press, 1978 |
| Original from | the University of Michigan |
| Digitized | 10 Dec 2007 |
| ISBN | 0127282505, 9780127282503 |
| Length | 564 pages |
| Subjects | › › Technology & Engineering / Electronics / General Technology & Engineering / General Technology & Engineering / Materials Science Thin films |
| Export Citation | BiBTeX EndNote RefMan |