Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
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Page 259
... With the increasingly stringent quality requirements imposed on CVD films , a thorough understanding of the underlying principles of the ... high - temperature species disappear III - 2 . CHEMICAL VAPOR DEPOSITION OF INORGANIC THIN FILMS 259.
... With the increasingly stringent quality requirements imposed on CVD films , a thorough understanding of the underlying principles of the ... high - temperature species disappear III - 2 . CHEMICAL VAPOR DEPOSITION OF INORGANIC THIN FILMS 259.
Page 260
John L. Vossen, Werner Kern. and temperatures , because many high - temperature species disappear or change upon cooling to room temperature . 1. Instrumental Analysis of the Vapor Phase The composition of the vapor phase can be assumed ...
John L. Vossen, Werner Kern. and temperatures , because many high - temperature species disappear or change upon cooling to room temperature . 1. Instrumental Analysis of the Vapor Phase The composition of the vapor phase can be assumed ...
Page 262
... thermal decomposition of gaseous species at the hot suscep- tor surface . Organometallic compounds , hydrides , and metal hydrides are particularly ... high - temperature vapor species , as exemplified 262 WERNER KERN AND VLADIMIR S. BAN ...
... thermal decomposition of gaseous species at the hot suscep- tor surface . Organometallic compounds , hydrides , and metal hydrides are particularly ... high - temperature vapor species , as exemplified 262 WERNER KERN AND VLADIMIR S. BAN ...
Contents
Glow Discharge Sputter Deposition | 13 |
Equipment Configuration | 31 |
Preconditioning of Targets Substrates and Systems for Film | 41 |
Copyright | |
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Å/min alloys anode Appl applications argon atoms bias bombardment cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition flow rate GaAs gases glow discharge polymerization H₂ H₂O heating HNO3 increase ion beam deposition ion source ionization layer mA/cm² magnetic field magnetron mask metal mTorr N₂ nitride O₂ operation oxide photoresist Phys planar plasma plasma etching plating PM sputtering polishing polymer polymer deposition potential pressure Proc produce ratio reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon silicon nitride SiO2 solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York µm/min