Thin Film Processes, Volume 1John L. Vossen, Werner Kern Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. |
From inside the book
Results 1-3 of 85
Page 309
... importance will be emphasized . Important reviews and surveys of semiconductor CVD have been noted in the introductory Section I , and many specific examples have been discussed already in Section II on fundamental aspects , allowing us ...
... importance will be emphasized . Important reviews and surveys of semiconductor CVD have been noted in the introductory Section I , and many specific examples have been discussed already in Section II on fundamental aspects , allowing us ...
Page 367
... important role , particularly at the early stage of coating . III . PROCESSING FACTORS OF GLOW DISCHARGE POLYMERIZATION It is extremely important to recognize the difference between poly- mer - forming and nonpolymer - forming plasmas ...
... important role , particularly at the early stage of coating . III . PROCESSING FACTORS OF GLOW DISCHARGE POLYMERIZATION It is extremely important to recognize the difference between poly- mer - forming and nonpolymer - forming plasmas ...
Page 414
... important etchant parameters in practical applications . A survey of the uses of se- lective etching of dielectrics in semiconductor device processing and in analytical applications for compositional and structural characterization has ...
... important etchant parameters in practical applications . A survey of the uses of se- lective etching of dielectrics in semiconductor device processing and in analytical applications for compositional and structural characterization has ...
Contents
Glow Discharge Sputter Deposition | 13 |
Equipment Configuration | 31 |
Preconditioning of Targets Substrates and Systems for Film | 41 |
Copyright | |
10 other sections not shown
Other editions - View all
Common terms and phrases
Å/min alloys anode Appl applications argon atoms bias bombardment cathode Chem chemical coatings composition compounds current density deposition rate dielectric discharge power effect electric Electrochem electron electroplating energy Epitaxial etch rate etchants etching processes film deposition flow rate GaAs gases glow discharge polymerization H₂ H₂O heating HNO3 increase ion beam deposition ion source ionization layer mA/cm² magnetic field magnetron mask metal mTorr N₂ nitride O₂ operation oxide photoresist Phys planar plasma plasma etching plating PM sputtering polishing polymer polymer deposition potential pressure Proc produce ratio reactants reaction reactive sputtering reactor Section semiconductor shown in Fig silicon silicon nitride SiO2 solution species sputter deposition Sputter Gun sputtering yield starting material stoichiometry substrate susceptor target surface techniques Technol temperature thermal thickness Thin Film Thin Solid Films tion U.S. Patent uniform vacuum vapor voltage wafer York µm/min